Update of the development progress of the High Power LPP-EUV light source using a magnetic field

被引：1
|
作者：
Ueda, Atsushi [1 ]
Nagai, Shinji [1 ]
Hori, Tsukasa [1 ]
Shiraishi, Yutaka [1 ]
Yanagida, Tatsuya [1 ]
Miyao, Kenichi [1 ]
Hayashi, Hideyuki [1 ]
Watanabe, Yukio [1 ]
Okamoto, Takeshi [1 ]
Abe, Tamotsu [1 ]
Kodama, Takeshi [1 ]
Nakarai, Hiroaki [1 ]
Saito, Takashi [1 ]
Mizoguchi, Hakaru [1 ]
机构：
[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan
来源：
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY X | 2019年 / 10957卷
关键词：
EUV light source; EUV lithography; Laser produced plasma; Tin; CO2; laser; Droplet generator; Debris mitigation; Magnetic field; PLASMAS;
D O I：
10.1117/12.2514809
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Gigaphoton Inc. is developing a laser produced plasma (LPP) extreme ultra violet (EUV) light source for high-volume-manufacturing (HVM) semiconductor lithography. Original technologies and key components of this source include a high-power carbon dioxide (CO2) laser with 15ns pulse duration, a short wavelength solid-state pre-pulse laser with 10ps pulse duration, a highly stabilized small droplet (DL) target, a precise laser-DL shooting control system and debris mitigation technology with a magnetic field. In this paper, an update of the development progress of the total system and of the key components is presented.
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页数：12
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