Update of Development Progress of the High Power LPP-EUV Light Source Using a Magnetic Field

被引：4

作者：

Kouge, Kouichiro ^{[1
]}

Nagai, Shinji ^{[1
]}

Hori, Tsukasa ^{[1
]}

Ueno, Yoshifumi ^{[1
]}

Yanagida, Tatsuya ^{[1
]}

Miyao, Kenichi ^{[1
]}

Hayashi, Hideyuki ^{[1
]}

Watanabe, Yukio ^{[1
]}

Abe, Tamotsu ^{[1
]}

Nakarai, Hiroaki ^{[1
]}

Saito, Takashi ^{[1
]}

Mizoguchi, Hakaru ^{[1
]}

机构：

[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2020年 / 33卷 / 01期

关键词：

EUV light source; EUV lithography; Laser produced plasma; Debris mitigation;

D O I：

10.2494/photopolymer.33.37

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Gigaphoton Inc. has been developing a CO2-Sn-LPP (LPP: Laser Produced Plasma) extreme ultraviolet (EUV) light source system for high-volume manufacturing (HVM) semiconductor lithography. Key components of the source include a high-power CO2 laser with 15 ns pulse duration and 100 kHz repetition frequency, a solid-state pre-pulse laser with 10 ps pulse duration, a high speed Sn-droplet generator, a high-speed and high accuracy shooting system, and a magnetic field debris mitigation system. To achieve an in-band power of 330 W with long collector mirror lifetime and stable output, we improved the performance of key system components. We achieved an in-band power of 250 W under DC operation and demonstrated a power scalability up to 330 W. This paper presents the key technology update of our EUV light source.

引用

页码：37 / 44

页数：8

共 50 条

[1] Update of development progress of the High Power LPP-EUV light source using a magnetic field
Niimi, Gouta
Nagai, Shinji
Hori, Tsukasa
Ueno, Yoshifumi
Yanagida, Tatsuya
Miyao, Kenichi
Hayashi, Hideyuki
Watanabe, Yukio
Abe, Tamotsu
Nakarai, Hiroaki
Saito, Takashi
Mizoguchi, Hakaru
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI, 2020, 11323
[2] Update of the development progress of the High Power LPP-EUV light source using a magnetic field
Ueda, Atsushi
Nagai, Shinji
Hori, Tsukasa
Shiraishi, Yutaka
Yanagida, Tatsuya
Miyao, Kenichi
Hayashi, Hideyuki
Watanabe, Yukio
Okamoto, Takeshi
Abe, Tamotsu
Kodama, Takeshi
Nakarai, Hiroaki
Saito, Takashi
Mizoguchi, Hakaru
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY X, 2019, 10957
[3] Update of the development progress of the High Power LPP-EUV light source using a magnetic field
Takashima, Yuta
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Hori, Tsukasa
Soumagne, Georg
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Miyao, Kenichi
Hayashi, Hideyuki
Watanabe, Yukio
Abe, Tamotsu
Nakarai, Hiroaki
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INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2019, 2019, 11147
[4] The development progress of the High Power LPP-EUV light source using a magnetic field
Hosoda, Hirokazu
Nagai, Shinji
Yanagida, Tatsuya
Shiraishi, Yutaka
Ueno, Yoshifumi
Miyao, Kenichi
Hayashi, Hideyuki
Watanabe, Yukio
Abe, Tamotsu
Nakarai, Hiroaki
Mizoguchi, Hakaru
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XII, 2021, 11609
[5] Key technology development progress of the High Power LPP-EUV light source
Nishimura, Yuichi
Ueno, Yoshifumi
Nagai, Shinji
Iwamoto, Fumio
Miyao, Kenichi
Hayashi, Hideyuki
Watanabe, Yukio
Abe, Tamotsu
Nakarai, Hiroaki
Mizoguchi, Hakaru
OPTICAL AND EUV NANOLITHOGRAPHY XXXV, 2022, 12051
[6] Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field
Nishimura, Yuichi
Hori, Tsukasa
Yabu, Takayuki
Wakana, Katsuhiko
Ueno, Yoshifumi
Soumagne, Georg
Nagai, Shinji
Yanagida, Tatsuya
Kawasuji, Yasufumi
Shiraishi, Yutaka
Abe, Tamotsu
Nakarai, Hiroaki
Saito, Takashi
Mizoguchi, Hakaru
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2018, 2018, 10809
[7] Key Components Development Progress Updates of the 250W High Power LPP-EUV Light Source
Ueno, Yoshifumi
Hori, Tsukasa
Kawasuji, Yasufumi
Shiraishi, Yutaka
Yanagida, Tatsuya
Miyao, Kenichi
Hayashi, Hideyuki
Ishii, Takuya
Watanabe, Yukio
Okamoto, Takeshi
Abe, Tamotsu
Kodama, Takeshi
Nakarai, Hiroaki
Yamazaki, Taku
Itou, Noritoshi
Saitou, Takashi
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EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IX, 2018, 10583
[8] Key Components Development Progress Updates of the 250W High Power LPP-EUV Light Source
Yabu, Takayuki
Kawasuji, Yasufumi
Hori, Tsukasa
Okamoto, Takeshi
Tanaka, Hiroshi
Miyao, Kenichi
Ishii, Takuya
Watanabe, Yukio
Yanagida, Tatsuya
Shiraishi, Yutaka
Abe, Tamotsu
Kodama, Takeshi
Nakarai, Hiroaki
Yamazaki, Taku
Itou, Noritoshi
Saito, Takashi
Mizoguchi, Hakaru
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2017, 2017, 10450
[9] LPP-EUV Light Source Development for High Volume Manufacturing Lithography
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Abe, Tamotsu
Ohta, Takeshi
Nowak, Krzysztof M.
Kawasuji, Yasufumi
Tanaka, Hiroshi
Watanabe, Yukio
Hori, Tsukasa
Kodama, Takeshi
Shiraishi, Yutaka
Yanagida, Tatsuya
Yamada, Tsuyoshi
Yamazaki, Taku
Okazaki, Shinji
Saitou, Takashi
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IV, 2013, 8679
[10] Key components technology update of the 250W High Power LPP-EUV light source
Yasufumi, Kawasuji
Nowak, Krzysztof M.
Hori, Tsukasa
Okamoto, Takeshi
Tanaka, Hiroshi
Watanabe, Yukio
Abe, Tamotsu
Kodama, Takeshi
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Nakarai, Hiroaki
Yamazaki, Taku
Okazaki, Shinji
Saito, Takashi
Mizoguchi, Hakaru
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VIII, 2017, 10143

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