Update of Development Progress of the High Power LPP-EUV Light Source Using a Magnetic Field

被引：4

作者：

Kouge, Kouichiro ^{[1
]}

Nagai, Shinji ^{[1
]}

Hori, Tsukasa ^{[1
]}

Ueno, Yoshifumi ^{[1
]}

Yanagida, Tatsuya ^{[1
]}

Miyao, Kenichi ^{[1
]}

Hayashi, Hideyuki ^{[1
]}

Watanabe, Yukio ^{[1
]}

Abe, Tamotsu ^{[1
]}

Nakarai, Hiroaki ^{[1
]}

Saito, Takashi ^{[1
]}

Mizoguchi, Hakaru ^{[1
]}

机构：

[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2020年 / 33卷 / 01期

关键词：

EUV light source; EUV lithography; Laser produced plasma; Debris mitigation;

D O I：

10.2494/photopolymer.33.37

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Gigaphoton Inc. has been developing a CO2-Sn-LPP (LPP: Laser Produced Plasma) extreme ultraviolet (EUV) light source system for high-volume manufacturing (HVM) semiconductor lithography. Key components of the source include a high-power CO2 laser with 15 ns pulse duration and 100 kHz repetition frequency, a solid-state pre-pulse laser with 10 ps pulse duration, a high speed Sn-droplet generator, a high-speed and high accuracy shooting system, and a magnetic field debris mitigation system. To achieve an in-band power of 330 W with long collector mirror lifetime and stable output, we improved the performance of key system components. We achieved an in-band power of 250 W under DC operation and demonstrated a power scalability up to 330 W. This paper presents the key technology update of our EUV light source.

引用

页码：37 / 44

页数：8

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