Update of the development progress of the High Power LPP-EUV light source using a magnetic field

被引：1
|
作者：
Ueda, Atsushi [1 ]
Nagai, Shinji [1 ]
Hori, Tsukasa [1 ]
Shiraishi, Yutaka [1 ]
Yanagida, Tatsuya [1 ]
Miyao, Kenichi [1 ]
Hayashi, Hideyuki [1 ]
Watanabe, Yukio [1 ]
Okamoto, Takeshi [1 ]
Abe, Tamotsu [1 ]
Kodama, Takeshi [1 ]
Nakarai, Hiroaki [1 ]
Saito, Takashi [1 ]
Mizoguchi, Hakaru [1 ]
机构：
[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan
来源：
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY X | 2019年 / 10957卷
关键词：
EUV light source; EUV lithography; Laser produced plasma; Tin; CO2; laser; Droplet generator; Debris mitigation; Magnetic field; PLASMAS;
D O I：
10.1117/12.2514809
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Gigaphoton Inc. is developing a laser produced plasma (LPP) extreme ultra violet (EUV) light source for high-volume-manufacturing (HVM) semiconductor lithography. Original technologies and key components of this source include a high-power carbon dioxide (CO2) laser with 15ns pulse duration, a short wavelength solid-state pre-pulse laser with 10ps pulse duration, a highly stabilized small droplet (DL) target, a precise laser-DL shooting control system and debris mitigation technology with a magnetic field. In this paper, an update of the development progress of the total system and of the key components is presented.
引用
收藏
页数：12
相关论文
共 50 条
  • [21] High Power LPP-EUV Source with Long Collector Mirror Lifetime for Semiconductor High Volume Manufacturing
    Mizoguchi, Hakaru
    Nakarai, Hiroaki
    Abe, Tamotsu
    Tanaka, Hiroshi
    Watanabe, Yukio
    Hori, Tsukasa
    Kodama, Takeshi
    Shiraishi, Yutaka
    Yanagida, Tatsuya
    Soumagne, Georg
    Yamada, Tsuyoshi
    Saitou, Takashi
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2019, 32 (01) : 77 - 86
  • [22] Development progress of Gigaphoton's LPP EUV light source for inspection systems
    Iwamoto, Fumio
    Ueno, Yoshifumi
    Nagai, Shinji
    Miyao, Kenichi
    Hayashi, Hideyuki
    Ishii, Takuya
    Abe, Tamotsu
    Nakarai, Hiroaki
    Saitou, Takashi
    OPTICAL AND EUV NANOLITHOGRAPHY XXXVII, 2024, 12953
  • [23] Development progress of Sn-LPP EUV light source for inspection systems
    Nishimura, Yuichi
    Ueno, Yoshifumi
    Nagai, Shinji
    Iwamoto, Fumio
    Miyao, Kenichi
    Hayashi, Hideyuki
    Ishii, Takuya
    Abe, Tamotsu
    Nakarai, Hiroaki
    Saitou, Takashi
    INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023, 2023, 12750
  • [24] Progress in LPP EUV source development at Osaka University
    Miyanaga, Noriaki
    Nishimura, Hiroaki
    Fujioka, Shinsuke
    Aota, Tatsuya
    Uchida, Shigeaki
    Yamaura, Michiteru
    Shimada, Yoshinori
    Hashimoto, Kazuhisa
    Nagai, Keiji
    Norimatsu, Takayoshi
    Nishihara, Katsunobu
    Murakami, Masakatsu
    Zhakhovskii, Vasilli
    Kang, Young Gwang
    Sunahara, Atsushi
    Furukawa, Hiroyuki
    Sasaki, Akira
    Nishikawa, Takeshi
    Nakatsuka, Masahiro
    Fujita, Hisanori
    Tsubakimoto, Koji
    Yoshida, Hidetsugu
    Izawa, Yasukazu
    Mima, Kunioki
    EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2, 2006, 6151 : U567 - U574
  • [25] Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source
    Ohta, Takeshi
    Nowak, Krzysztof M.
    Suganuma, Takashi
    Kameda, Hidenobu
    Moriya, Masato
    Yokoduka, Toshio
    Kawasuji, Yasufumi
    Fujimoto, Junichi
    Mizoguchi, Hakaru
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY III, 2012, 8322
  • [26] LPP EUV light source employing high power CO2 laser
    Hoshino, Hideo
    Suganuma, Takashi
    Asayama, Takeshi
    Nowak, Krzysztof
    Moriya, Masato
    Abe, Tamotsu
    Endo, Akira
    Surnitani, Akira
    EMERGING LITHOGRAPHIC TECHNOLOGIES XII, PTS 1 AND 2, 2008, 6921 : 92131 - 92131
  • [27] Challenge of >300W High Power LPP-EUV Source with Long Collector Mirror Lifetime for Semiconductor HVM
    Mizoguchi, Hakaru
    Nakarai, Hiroaki
    Abe, Tamotsu
    Tanaka, Hiroshi
    Watanabe, Yukio
    Hori, Tsukasa
    Shiraishi, Yutaka
    Yanagida, Tatsuya
    Soumagne, Georg
    Yamada, Tsuyoshi
    Saitou, Takashi
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI, 2020, 11323
  • [28] 3D PIC simulation of ion debris mitigation by B-field for LPP-EUV source
    Nunami, Masanori
    Takata, Akira
    Nishihara, Katsunobu
    5TH INTERNATIONAL CONFERENCE ON INERTIAL FUSION SCIENCES AND APPLICATIONS (IFSA2007), 2008, 112
  • [29] Challenge of >300W High Power LPP-EUV Source with Long Collector Mirror Lifetime-III for Semiconductor HVM
    Mizoguchi, Hakaru
    Nakarai, Hiroaki
    Abe, Tamotsu
    Tanak, Hiroshi
    Watanabe, Yukio
    Hori, Tsukasa
    Shiraishi, Yutaka
    Yanagida, Tatsuya
    Soumagne, George
    Yamada, Tsuyoshi
    Saitou, Takashi
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XII, 2021, 11609
  • [30] EUV Light Source by High Power Laser
    Izawa, Y.
    Nishihara, K.
    Tanuma, H.
    Sasaki, A.
    Murakami, M.
    Sunahara, A.
    Nishimura, H.
    Fujioka, S.
    Aota, T.
    Shimada, Y.
    Yamaura, M.
    Nakatsuka, M.
    Fujita, H.
    Tsubakimoto, K.
    Yoshida, H.
    Miyanaga, N.
    Mima, K.
    5TH INTERNATIONAL CONFERENCE ON INERTIAL FUSION SCIENCES AND APPLICATIONS (IFSA2007), 2008, 112
12345