Update of the development progress of the High Power LPP-EUV light source using a magnetic field

被引：1

作者：

Ueda, Atsushi ^{[1
]}

Nagai, Shinji ^{[1
]}

Hori, Tsukasa ^{[1
]}

Shiraishi, Yutaka ^{[1
]}

Yanagida, Tatsuya ^{[1
]}

Miyao, Kenichi ^{[1
]}

Hayashi, Hideyuki ^{[1
]}

Watanabe, Yukio ^{[1
]}

Okamoto, Takeshi ^{[1
]}

Abe, Tamotsu ^{[1
]}

Kodama, Takeshi ^{[1
]}

Nakarai, Hiroaki ^{[1
]}

Saito, Takashi ^{[1
]}

Mizoguchi, Hakaru ^{[1
]}

机构：

[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan

来源：

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY X | 2019年 / 10957卷

关键词：

EUV light source; EUV lithography; Laser produced plasma; Tin; CO2; laser; Droplet generator; Debris mitigation; Magnetic field; PLASMAS;

D O I：

10.1117/12.2514809

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Gigaphoton Inc. is developing a laser produced plasma (LPP) extreme ultra violet (EUV) light source for high-volume-manufacturing (HVM) semiconductor lithography. Original technologies and key components of this source include a high-power carbon dioxide (CO2) laser with 15ns pulse duration, a short wavelength solid-state pre-pulse laser with 10ps pulse duration, a highly stabilized small droplet (DL) target, a precise laser-DL shooting control system and debris mitigation technology with a magnetic field. In this paper, an update of the development progress of the total system and of the key components is presented.

引用

页数：12

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