Ta-Si-O absorptive shifter for the attenuated phase-shifting mask

被引：1
|
作者：
Yan, YS [1 ]
Cheng, CC [1 ]
Lin, CL [1 ]
Gan, JY [1 ]
Wu, TB [1 ]
Tuo, LC [1 ]
Wang, JJ [1 ]
机构：
[1] NATL TSING HUA UNIV,DEPT MAT SCI & ENGN,HSINCHU,TAIWAN
来源：
PHOTOMASK AND X-RAY MASK TECHNOLOGY III | 1996年 / 2793卷
关键词：
phase-shifting mask; PSM; attenuated phase-shifting mask; APSM; variable angle spectroscopic ellipsometer;
D O I：
10.1117/12.245212
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：155 / 164
页数：10
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