Application of zirconium silicon oxide films to an attenuated phase-shifting mask in ArF lithography

被引：0
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作者：
Matsuo, Takahiro [1 ]
Onodera, Toshio [1 ]
Nakazawa, Keisuke [1 ]
Ogawa, Tohru [1 ]
Morimoto, Hiroaki [1 ]
Haraguchi, Takashi [2 ]
Fukuhara, Nobuhiko [2 ]
Matsuo, Tadashi [2 ]
Otaki, Masao [2 ]
Takeuchi, Susumu [2 ]
机构：
[1] Semiconduct. Leading Edge T., 292 Yoshida-cho, Yokohama, Kanagawa 244-0817, Japan
[2] Toppan Printing Co., Ltd., 4-2-3 Takanodai-minami, Kita-Katsushika, Saitama 345-8508, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1999年 / 38卷 / 12 B期
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页码：7004 / 7007
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