Ta-Si-O absorptive shifter for the attenuated phase-shifting mask

被引：1
|
作者：
Yan, YS [1 ]
Cheng, CC [1 ]
Lin, CL [1 ]
Gan, JY [1 ]
Wu, TB [1 ]
Tuo, LC [1 ]
Wang, JJ [1 ]
机构：
[1] NATL TSING HUA UNIV,DEPT MAT SCI & ENGN,HSINCHU,TAIWAN
来源：
PHOTOMASK AND X-RAY MASK TECHNOLOGY III | 1996年 / 2793卷
关键词：
phase-shifting mask; PSM; attenuated phase-shifting mask; APSM; variable angle spectroscopic ellipsometer;
D O I：
10.1117/12.245212
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：155 / 164
页数：10
相关论文
共 50 条
  • [31] (LaNiO3)(x)(Ta2O5)(1-x) oxide thin films for attenuated phase-shifting mask blank
    Cheng, CC
    Wu, TB
    Gan, JY
    PHOTOMASK AND X-RAY MASK TECHNOLOGY III, 1996, 2793 : 146 - 154
  • [32] DETECTION AND PRINTABILITY OF SHIFTER DEFECTS IN PHASE-SHIFTING MASKS
    WATANABE, H
    TODOKORO, Y
    INOUE, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (11B): : 3016 - 3020
  • [33] Control of side-lobe intensity for attenuated phase-shifting mask in 157 nm lithography
    Watanabe, K
    Kurose, E
    Suganaga, T
    Itani, T
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY X, 2003, 5130 : 736 - 744
  • [34] IMPROVING RESOLUTION IN PHOTOLITHOGRAPHY WITH A PHASE-SHIFTING MASK
    LEVENSON, MD
    VISWANATHAN, NS
    SIMPSON, RA
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (12) : 1828 - 1836
  • [35] Phase-shifting mask of 100 nm resolution
    Lu, Jing
    Chen, Bao-Qin
    Liu, Ming
    Wang, Yun-Xiang
    Long, Shi-Bing
    Li, Ling
    Weixi Jiagong Jishu/Microfabrication Technology, 2003, (04):
  • [36] Optical microlithographic phase-shifting mask technology
    Feng, BR
    Sun, GL
    Shen, F
    Que, L
    Chen, BQ
    Cui, Z
    17TH CONGRESS OF THE INTERNATIONAL COMMISSION FOR OPTICS: OPTICS FOR SCIENCE AND NEW TECHNOLOGY, PTS 1 AND 2, 1996, 2778 : 243 - 244
  • [37] Dielectric properties of amorphous Ta-Ge-O and Ta-Si-O thin films
    Nad, T. A.
    van Dover, R. B.
    JOURNAL OF APPLIED PHYSICS, 2018, 123 (24)
  • [38] New approach to phase metrology for manufacturing of 248 nm lithography based embedded attenuated phase-shifting mask
    Dao, G
    Liu, G
    Snyder, A
    Farnsworth, J
    PHOTOMASK AND X-RAY MASK TECHNOLOGY III, 1996, 2793 : 359 - 370
  • [39] A NEW TYPE OF POLARIZATION PHASE-SHIFTER FOR PHASE-SHIFTING INTERFEROMETRY
    SU, DC
    SHYU, LH
    OPTIK, 1992, 90 (02): : 53 - 56
  • [40] SHEARING INTERFEROMETER FOR PHASE-SHIFTING INTERFEROMETRY WITH POLARIZATION PHASE-SHIFTER
    KOTHIYAL, MP
    DELISLE, C
    APPLIED OPTICS, 1985, 24 (24) : 4439 - 4442
12345