Ta-Si-O absorptive shifter for the attenuated phase-shifting mask

被引：1

作者：

Yan, YS ^{[1
]}

Cheng, CC ^{[1
]}

Lin, CL ^{[1
]}

Gan, JY ^{[1
]}

Wu, TB ^{[1
]}

Tuo, LC ^{[1
]}

Wang, JJ ^{[1
]}

机构：

[1] NATL TSING HUA UNIV,DEPT MAT SCI & ENGN,HSINCHU,TAIWAN

来源：

PHOTOMASK AND X-RAY MASK TECHNOLOGY III | 1996年 / 2793卷

关键词：

phase-shifting mask; PSM; attenuated phase-shifting mask; APSM; variable angle spectroscopic ellipsometer;

D O I：

10.1117/12.245212

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：155 / 164

页数：10

共 50 条

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