TiSixOy as an absorptive shifter for embedded phase-shifting mask in 248 nm and the modification of R-T method for the determination of shifter's n and k

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Natl Chiao Tung Univ, Hsin-Chu, Taiwan ^{[1
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Microelectron Eng | / 125-128期

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[1] TiSixOy as an absorptive shifter for embedded phase-shifting mask in 248 nm and the modification of R-T method for the determination of shifter's n and k
Loong, WA
Chen, CW
Chang, YH
Lin, CM
Cui, Z
Lung, CA
MICROELECTRONIC ENGINEERING, 1998, 42 : 125 - 128
[2] Correlation between the chemical compositions and optical properties of AlSixNy embedded layer for attenuated phase-shifting mask in 193 nm and the modification of the R-T method for measuring n and k
Lin, CM
Loong, WA
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06): : 3371 - 3375