Modelling by using multiphonon emission theory of data retention characteristics in charge trapping flash memory

被引:0
|
作者
Son, Y. [1 ]
Kang, M. [2 ]
机构
[1] Samsung Elect, Semicond Res Ctr, San 16, Hwasung City 445701, Gyeonggi Do, South Korea
[2] Korea Natl Univ Transportat, Dept Elect Engn, 50 Daehak Ro, Chungju Si 380702, Chungbuk, South Korea
关键词
flash memories; electron traps; hole traps; phonons; charge storage area; trap energy level; charge loss mechanism; charge trap flash memory; nonArrhenius behaviour; charge trapping flash memory; data retention characteristics; multiphonon emission theory; TEMPERATURE;
D O I
10.1049/el.2015.4427
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Data retention characteristics are investigated in charge trapping flash memory. The physical root cause of the non-Arrhenius behaviour, which is the general retention characteristic in charge trap flash memories, is numerical modelling that the charge loss mechanism is associated with the trap energy level in the charge storage area. For expression of the charge loss in the relatively shallow traps, multiphonon emission model is adopted. Finally, the ratio of the relatively shallow traps to middle and deep level traps is extracted in a sample data.
引用
收藏
页码:434 / U66
页数:2
相关论文
共 50 条
  • [31] Cause of data retention loss in a nitride-based localized trapping storage flash memory cell
    Tsai, WJ
    Gu, SH
    Zous, NK
    Yeh, CC
    Liu, CC
    Chen, CH
    Wang, TH
    Pan, S
    Lu, CY
    40TH ANNUAL PROCEEDINGS: INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM, 2002, : 34 - 38
  • [32] Charge-Trapping Characteristics of BaTiO3 with Various Zr Contents for Flash Memory Applications
    Li, F.
    Huang, X. D.
    2017 IEEE 17TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO), 2017, : 579 - 580
  • [33] Data retention characteristics of sub-100 nm NAND flash memory cells
    Lee, JD
    Choi, JH
    Park, D
    Kim, K
    IEEE ELECTRON DEVICE LETTERS, 2003, 24 (12) : 748 - 750
  • [34] Effects of interface trap generation and annihilation on the data retention characteristics of flash memory cells
    Lee, JD
    Choi, JH
    Park, D
    Kim, K
    IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2004, 4 (01) : 110 - 117
  • [35] Nanowire width dependence of data retention and endurance characteristics in nanowire SONOS flash memory
    Choi, Jin Hyung
    Yu, Chong Gun
    Park, Jong Tae
    MICROELECTRONICS RELIABILITY, 2016, 64 : 215 - 219
  • [36] Nitrided GdTiO as Charge-Trapping Layer for Flash Memory Applications
    Tao, Qing-Bo
    Lai, P. T.
    2012 IEEE 11TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY (ICSICT-2012), 2012, : 927 - 929
  • [37] Data retention failure in NOR flash memory cells
    Lee, WH
    Lee, DK
    Park, YM
    Kim, KS
    Ahn, KO
    Suh, KD
    39TH ANNUAL PROCEEDINGS: INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM 2001, 2001, : 57 - 60
  • [38] Improved high temperature retention for charge-trapping memory by using double quantum barriers
    Yang, H. J.
    Chin, Albert
    Lin, S. H.
    Yeh, F. S.
    McAlister, S. P.
    IEEE ELECTRON DEVICE LETTERS, 2008, 29 (04) : 386 - 388
  • [39] Retention loss characteristics of localizead charge-trapping devices
    Lusky, E
    Shacham-Diamand, Y
    Shappir, A
    Bloom, I
    Cohen, G
    Eitan, B
    2004 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS, 2004, : 527 - 530
  • [40] Charge-Trapping-Type Flash Memory Device With Stacked High-k Charge-Trapping Layer
    Tsai, Ping-Hung
    Chang-Liao, Kuei-Shu
    Liu, Te-Chiang
    Wang, Tien-Ko
    Tzeng, Pei-Jer
    Lin, Cha-Hsin
    Lee, L. S.
    Tsai, Ming-Jinn
    IEEE ELECTRON DEVICE LETTERS, 2009, 30 (07) : 775 - 777