Modelling by using multiphonon emission theory of data retention characteristics in charge trapping flash memory

被引:0
|
作者
Son, Y. [1 ]
Kang, M. [2 ]
机构
[1] Samsung Elect, Semicond Res Ctr, San 16, Hwasung City 445701, Gyeonggi Do, South Korea
[2] Korea Natl Univ Transportat, Dept Elect Engn, 50 Daehak Ro, Chungju Si 380702, Chungbuk, South Korea
关键词
flash memories; electron traps; hole traps; phonons; charge storage area; trap energy level; charge loss mechanism; charge trap flash memory; nonArrhenius behaviour; charge trapping flash memory; data retention characteristics; multiphonon emission theory; TEMPERATURE;
D O I
10.1049/el.2015.4427
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Data retention characteristics are investigated in charge trapping flash memory. The physical root cause of the non-Arrhenius behaviour, which is the general retention characteristic in charge trap flash memories, is numerical modelling that the charge loss mechanism is associated with the trap energy level in the charge storage area. For expression of the charge loss in the relatively shallow traps, multiphonon emission model is adopted. Finally, the ratio of the relatively shallow traps to middle and deep level traps is extracted in a sample data.
引用
收藏
页码:434 / U66
页数:2
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