Accurate Lifetime Estimation of Sub-20-nm NAND Flash Memory

被引:28
|
作者
Lee, Kyunghwan [1 ]
Kang, Myounggon [2 ]
Hwang, Yuchul [3 ]
Shin, Hyungcheol [1 ]
机构
[1] Seoul Natl Univ, Sch Elect Engn & Comp Sci, Interuniv Semicond Res Ctr, Seoul 151742, South Korea
[2] Korea Natl Univ Transportat, Dept Elect Engn, Chungju 380702, South Korea
[3] Samsung Elect Co Ltd, Memory Div, Prod Qual Assurance Team, Hwasung 445701, South Korea
关键词
Activation energy (E-a); Arrhenius model; contribution rate (CR); criterion of Delta V-th_Total; lifetime estimation; multilevel cell NAND flash memory; program/erase cycling times; retention time; INTERFACE-TRAP GENERATION; FAILURE MECHANISMS; RETENTION CHARACTERISTICS; ACTIVATION-ENERGY; DEGRADATION; MODEL; DEPENDENCE; TIME;
D O I
10.1109/TED.2015.2509004
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Previously, we developed a charge loss/gain model for NAND flash memory, which is taking into account various failure mechanisms. In addition, we extracted all the parameters of the new model in the highest (PV3) and lowest states (ERS). In this paper, however, the physical information for the parameters and the whole procedure of the parameter extraction are covered in detail. We also extracted the contribution rate (CR) of dominant mechanisms at the criterion of vertical bar Delta V-th_Total vertical bar according to the baking temperature. The results give the physical reason for abnormal retention behaviors such as apparent activation energy (E-aa) roll-off at the PV3 state and negative E-aa at the ERS state. Using the proposed method, we extracted the accurate lifetime at room temperature in all states (PV3, PV2, PV1, and ERS). A large gap was observed in the results of the lifetime estimation, which were extracted by the conventional Arrhenius model and the proposed model. Since the proposed model takes into account the retention characteristics for various mechanisms, this model provides a much more accurate prediction for the lifetime.
引用
收藏
页码:659 / 667
页数:9
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