N-type in-situ doping effect on vapour-liquid-solid silicon nanowire properties for gas sensing applications

被引:9
|
作者
Pichon, L. [1 ]
Rogel, R. [1 ]
Jacques, E. [1 ]
Salaun, A. C. [1 ]
机构
[1] Inst Elect & Telecommun Rennes, Dept Microelect & Microcapteurs, F-35042 Rennes, France
关键词
VLS silicon nanowires; N-type in-situ doping; resistors; ammonia detection; RESISTORS; DNA;
D O I
10.1002/pssc.201300206
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
N-type in-situ doped SiNWs based resistors are fabricated and used as gas (ammonia) sensors. SiNWs are prepared by vapour-liquid-solid method (VLS) using gold as catalyst. In-situ doping level is adjusted by varying the phosphine to silane mole ratio. Because SiNWs can act as sensitive units specific design is developed to allow large sensing areas, following a process fabrication compatible with a mass production planar layout. SiNWs doping effect on ammonia detection is carried out under controlled ammonia/nitrogen mixture varying from 2 ppm to 700 ppm. Results highlight that the relative response, S-g=(I-0-I-g)/I-0, where I-0 and Ig are the current values in vacuum and reactive ambient respectively, follows a linear behaviour. The relative sensitivity, (S=Delta S-g/Delta[NH3]) decreases, whereas the sensitivity (SxI(0)) increases with the increase of the VLS SiNWs doping level. (C) 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:344 / 348
页数:5
相关论文
共 50 条
  • [41] Morphological and optical properties of n-type porous silicon: effect of etching current density
    M DAS
    D SARKAR
    Bulletin of Materials Science, 2016, 39 : 1671 - 1676
  • [42] Formation of Si:CP layer through in-situ doping and implantation process for n-type metal-oxide-semiconductor devices
    Mochizuki, Shogo
    Loesing, Rainer
    Zhu, Zhengmao
    Domenicucci, Anthony G.
    Flaitz, Philip L.
    Li, Jinghong
    Paruchuri, Vamsi
    THIN SOLID FILMS, 2014, 557 : 94 - 100
  • [43] In situ p- and n-type doping of low-temperature grown beta-SiC epitaxial layers on silicon
    Moller, H
    Krotz, G
    Legner, W
    Wagner, C
    Muller, G
    Smith, L
    Leese, B
    Jones, A
    Rushworth, S
    SILICON CARBIDE AND RELATED MATERIALS 1995, 1996, 142 : 497 - 500
  • [44] Gas-sensing properties at room temperature for the sensors based on tungsten oxide thin films sputtered on n-type ordered porous silicon
    Hu Ming
    Liu Qing-Lin
    Jia Ding-Li
    Li Ming-Da
    ACTA PHYSICA SINICA, 2013, 62 (05)
  • [45] Rectifying performance of p-type tin(II) sulfide contacts on n-type silicon: Effect of silicon nanowire sulfidation on electronic transport of heterojunction diodes
    Ruan, Cheng-He
    Lin, Yow-Jon
    Chen, Ya-Hui
    Chang, Hsing-Cheng
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2015, 32 : 62 - 67
  • [46] Effect of metal impurities concentration on electrical properties in N-type Recharged-Czochralski silicon
    Hu, Zhiqiang
    Cong, Mu
    Zhang, Xinyu
    Li, Jiayan
    Zhang, Jiangang
    Tan, Yi
    Ou, Ziyang
    Chen, Yangjun
    Liu, Changming
    Jiang, Dachuan
    Li, Pengting
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2023, 260
  • [47] Effect of an In-situ Process on Electrical Properties of n-Type Pentacene-Based Metal-Oxide-Semiconductor Diodes with Yb Donor Layer
    Song, Younguk
    Ishiwara, Hiroshi
    Ohmi, Shun-ichiro
    APPLIED PHYSICS EXPRESS, 2012, 5 (03)
  • [48] Effect of in situ Sb doping on crystalline and electrical characteristics of n-type Ge1-xSnx epitaxial layer
    Jeon, Jihee
    Asano, Takanori
    Shimura, Yosuke
    Takeuchi, Wakana
    Kurosawa, Masashi
    Sakashita, Mitsuo
    Nakatsuka, Osamu
    Zaima, Shigeaki
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (04)
  • [49] N-type doping of germanium epilayer on silicon by ex-situ phosphorus diffusion based on POCl3 phosphosilicate glass
    Park, Chan-Hyuck
    Pan, Han
    Ishikawa, Yasuhiko
    Wada, Kazumi
    Ahn, Donghwan
    THIN SOLID FILMS, 2018, 662 : 1 - 5
  • [50] N-TYPE POLYCRYSTALLINE SILICON FILMS OBTAINED BY CRYSTALLIZATION OF IN-SITU PHOSPHORUS-DOPED AMORPHOUS-SILICON FILMS DEPOSITED AT LOW-PRESSURE
    SARRET, M
    LIBA, A
    LEBIHAN, F
    JOUBERT, P
    FORTIN, B
    JOURNAL OF APPLIED PHYSICS, 1994, 76 (09) : 5492 - 5497