N-type in-situ doping effect on vapour-liquid-solid silicon nanowire properties for gas sensing applications

被引:9
|
作者
Pichon, L. [1 ]
Rogel, R. [1 ]
Jacques, E. [1 ]
Salaun, A. C. [1 ]
机构
[1] Inst Elect & Telecommun Rennes, Dept Microelect & Microcapteurs, F-35042 Rennes, France
关键词
VLS silicon nanowires; N-type in-situ doping; resistors; ammonia detection; RESISTORS; DNA;
D O I
10.1002/pssc.201300206
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
N-type in-situ doped SiNWs based resistors are fabricated and used as gas (ammonia) sensors. SiNWs are prepared by vapour-liquid-solid method (VLS) using gold as catalyst. In-situ doping level is adjusted by varying the phosphine to silane mole ratio. Because SiNWs can act as sensitive units specific design is developed to allow large sensing areas, following a process fabrication compatible with a mass production planar layout. SiNWs doping effect on ammonia detection is carried out under controlled ammonia/nitrogen mixture varying from 2 ppm to 700 ppm. Results highlight that the relative response, S-g=(I-0-I-g)/I-0, where I-0 and Ig are the current values in vacuum and reactive ambient respectively, follows a linear behaviour. The relative sensitivity, (S=Delta S-g/Delta[NH3]) decreases, whereas the sensitivity (SxI(0)) increases with the increase of the VLS SiNWs doping level. (C) 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:344 / 348
页数:5
相关论文
共 50 条
  • [21] The Effect of Hydrogen Doping on the Electrochemical Etching of Ion-Irradiated n-Type Silicon
    Liang, H. D.
    Breese, M. B. H.
    Duttagupta, S.
    Aberle, A. G.
    Bettiol, A. A.
    Venkatesan, T.
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2018, 7 (08) : N110 - N113
  • [22] EFFECT OF QUENCHING AND ELECTRON-IRRADIATION ON THE PROPERTIES OF N-TYPE SILICON
    BEREZINA, GM
    KORSHUNOV, FP
    INORGANIC MATERIALS, 1983, 19 (09) : 1255 - 1258
  • [23] Annealing Effect on the Composition and Electrophysical Properties of N-Type Silicon Surface
    Bzhikhatlov, Kantemir
    Luev, Valeriy
    NANO HYBRIDS AND COMPOSITES, 2020, 28 : 53 - 58
  • [24] Effect of light intensity on photoluminescence properties of n-type porous silicon
    Abouliatim, A
    Joubert, P
    Guyader, P
    THIN SOLID FILMS, 1996, 276 (1-2) : 208 - 211
  • [25] Effect of Zr Doping on Thermoelectric Properties of n-Type HfPtPb CompoundsEffect of Zr Doping on Thermoelectric Properties of n-Type HfPtPb CompoundsWei, Wan, Zhang, Hu, Tian, and Luo
    Hao Wei
    Rundong Wan
    Zhengfu Zhang
    Fanbin Hu
    Guocai Tian
    Huilong Luo
    Journal of Electronic Materials, 2025, 54 (4) : 2710 - 2724
  • [26] B-doping of vapour-liquid-solid grown Au-catalysed and Al-catalysed Si nanowires:: effects of B2H6 gas during Si nanowire growth and B-doping by a post-synthesis in situ plasma process
    Whang, Sung-Jin
    Lee, Sungjoo
    Chi, Dong-Zhi
    Yang, Wei-Feng
    Cho, Byung-Jin
    Liew, Yun-Fook
    Kwong, Dim-Lee
    NANOTECHNOLOGY, 2007, 18 (27)
  • [27] Fabrication of n-type ZnO nanowire/graphene/p-type silicon hybrid structures and electrical properties of heterojunctions
    Liang, Zhiwen
    Cai, Xiang
    Tan, Shaozao
    Yang, Peihua
    Zhang, Long
    Yu, Xiang
    Chen, Keqiu
    Zhu, Hanming
    Liu, Pengyi
    Mai, Wenjie
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2012, 14 (46) : 16111 - 16114
  • [28] Regulating electronic properties of graphene sheet via n-type doping for solar cells applications
    Malik, Palak
    Kumari, Geetanjali
    Neelankshi
    Sharma, Preetika
    Singh, Sukhbir
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2020, 31 (17) : 14306 - 14313
  • [29] Optical properties of electrochemically etched N-type silicon wafers for solar cell applications
    Kralik, Martin
    Goraus, Matej
    Pincik, Emil
    JOURNAL OF ELECTRICAL ENGINEERING-ELEKTROTECHNICKY CASOPIS, 2020, 71 (06): : 406 - 412
  • [30] Regulating electronic properties of graphene sheet via n-type doping for solar cells applications
    Palak Malik
    Geetanjali Kumari
    Preetika Neelankshi
    Sukhbir Sharma
    Journal of Materials Science: Materials in Electronics, 2020, 31 : 14306 - 14313