High-speed, short-channel polycrystalline silicon thin-film transistors

被引:43
|
作者
Brotherton, SD [1 ]
Glasse, C [1 ]
Glaister, C [1 ]
Green, P [1 ]
Rohlfing, F [1 ]
Ayres, JR [1 ]
机构
[1] Philips Res Labs, Redhill RH1 5HA, Surrey, England
关键词
D O I
10.1063/1.1639137
中图分类号
O59 [应用物理学];
学科分类号
摘要
Results are presented on the performance of low-temperature, short-channel polycrystalline silicon (poly-Si) thin-film transistors (TFTs), with channel length down to 0.5 mum, and scaled gate oxide thickness down to 20 nm. Good TFT switching characteristics were obtained, and the uniformity of short-channel TFTs was shown to have a standard deviation of better then 10%, even for channel widths as small as 4 mum. The 0.5 mum TFTs have been incorporated into a 15-stage complementary pair metal-oxide-Si transistor ring oscillator, which, at a supply voltage of 3 V, operated with a delay/stage of similar to0.1 ns. (C) 2004 American Institute of Physics.
引用
收藏
页码:293 / 295
页数:3
相关论文
共 50 条
  • [21] Compact Modeling of Short-Channel Effects in Staggered Organic Thin-Film Transistors
    Pruefer, Jakob
    Leise, Jakob
    Darbandy, Ghader
    Nikolaou, Aristeidis
    Klauk, Hagen
    Borchert, James W.
    Iniguez, Benjamin
    Gneiting, Thomas
    Kloes, Alexander
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2020, 67 (11) : 5082 - 5090
  • [22] Characterization of polycrystalline silicon thin-film transistors
    Sameshima, T
    Kimura, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (3A): : 1534 - 1539
  • [23] Universal compact model for long- and short-channel Thin-Film Transistors
    Iniguez, Benjamin
    Picos, Rodrigo
    Veksler, Dmitry
    Koudymov, A.
    Shur, Michael S.
    Ytterdal, Trond
    Jackson, Warren
    SOLID-STATE ELECTRONICS, 2008, 52 (03) : 400 - 405
  • [24] Short-Channel BEOL ZnON Thin-Film Transistors with Superior Mobility Performance
    Kuan, Chin-I
    Lin, Horng-Chih
    Li, Pei-Wen
    Huang, Tiao-Yuan
    2016 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATION (VLSI-TSA), 2016,
  • [25] Analysis of threshold voltage of short channel polycrystalline silicon thin-film transistors fabricated on large grains
    Kawachi, Genshiro
    Tsuboi, Shinzo
    Okada, Takashi
    Mitani, Masahiro
    Matsumura, Masakiyo
    JOURNAL OF APPLIED PHYSICS, 2006, 100 (11)
  • [26] Analysis of threshold voltage of short channel polycrystalline silicon thin-film transistors fabricated on large grains
    Kawachi, Genshiro
    Tsuboi, Shinzo
    Okada, Takashi
    Mitani, Masahiro
    Matsumura, Masakiyo
    Journal of Applied Physics, 2006, 100 (11):
  • [27] P-CHANNEL POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS ON GLASS SUBSTRATES
    YAMAGUCHI, F
    TANAKA, S
    NITTA, Y
    TOMITA, K
    DOI, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (08): : L1388 - L1391
  • [28] RADIATION EFFECTS ON N-CHANNEL POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS
    YANG, CK
    LEE, CL
    LEI, TF
    CHERN, HN
    APPLIED PHYSICS LETTERS, 1995, 67 (23) : 3477 - 3479
  • [29] High electric field phenomena in polycrystalline silicon thin-film transistors
    Fortunato, G
    Carluccio, R
    Colalongo, L
    Giovannini, S
    Mariucci, L
    Massussi, F
    Valdinoci, M
    ACTIVE MATRIX LIQUID CRYSTAL DISPLAYS TECHNOLOGY AND APPLICATIONS, 1997, 3014 : 148 - 159
  • [30] Reliability in Short-Channel p-Type Polycrystalline Silicon Thin-Film Transistor under High Gate and Drain Bias Stress
    Choi, Sung-Hwan
    Kim, Sun-Jae
    Mo, Yeon-Gon
    Kim, Hye-Dong
    Han, Min-Koo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (03)