High-speed, short-channel polycrystalline silicon thin-film transistors

被引:43
|
作者
Brotherton, SD [1 ]
Glasse, C [1 ]
Glaister, C [1 ]
Green, P [1 ]
Rohlfing, F [1 ]
Ayres, JR [1 ]
机构
[1] Philips Res Labs, Redhill RH1 5HA, Surrey, England
关键词
D O I
10.1063/1.1639137
中图分类号
O59 [应用物理学];
学科分类号
摘要
Results are presented on the performance of low-temperature, short-channel polycrystalline silicon (poly-Si) thin-film transistors (TFTs), with channel length down to 0.5 mum, and scaled gate oxide thickness down to 20 nm. Good TFT switching characteristics were obtained, and the uniformity of short-channel TFTs was shown to have a standard deviation of better then 10%, even for channel widths as small as 4 mum. The 0.5 mum TFTs have been incorporated into a 15-stage complementary pair metal-oxide-Si transistor ring oscillator, which, at a supply voltage of 3 V, operated with a delay/stage of similar to0.1 ns. (C) 2004 American Institute of Physics.
引用
收藏
页码:293 / 295
页数:3
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