Optimization of nanoscale silicon waveguide fabrication

被引：0

作者：

Chen, Yao ^{[1
,2
]}

Feng, Junbo ^{[1
]}

Zhou, Zhiping ^{[1
,3
,4
]}

Yu, Jun ^{[2
]}

Summers, Christopher J. ^{[5
]}

Citrin, David S. ^{[4
,6
]}

机构：

[1] Huazhong Univ Sci & Technol, Wuhan Natl Lab Optoelect, Wuhan 430074, Hubei, Peoples R China

[2] Huazhong Univ Sci & Technol, Dept Elect Sci & Technol, Wuhan 430074, Hubei, Peoples R China

[3] Peking Univ, State Key Lab Adv Opt Commun Syst & Networks, Beijing 100871, Peoples R China

[4] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA

[5] Georgia Inst Technol, Sch Mat Sci & Engn, Atlanta, GA 30332 USA

[6] Georgia Tech Lorraine, Georgia Tech CNRS, Unit Mixte Int 2958, F-57070 Metz, France

来源：

AOE 2008: ASIA OPTICAL FIBER COMMUNICATION AND OPTOELECTRONIC EXPOSITION AND CONFERENCE | 2009年

关键词：

ETCH PROCESS; PLASMAS;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A simple and effective technique was developed to improve the nanoscale silicon waveguide fabrication. 40 nanometer features with smooth and vertical sidewall are demonstrated. With this technique, nanoscale silicon grating coupler was obtained. (C)2008 Optical Society ofAmerica

引用

页数：3

共 50 条

[21] Fabrication of optical waveguide using silicon oxynitride prepared by thermal oxidation of silicon rich silicon nitride
Wong, C. K.
Wong, H.
Chan, M.
Kok, C. W.
Chan, H. P.
2005 IEEE CONFERENCE ON ELECTRON DEVICES AND SOLID-STATE CIRCUITS, PROCEEDINGS, 2005, : 471 - 474
[22] Fabrication, characterization, and optimization of an ultraviolet silicon sensor
Berman-Mendoza, Dainet
Aceves-Mijares, Mariano
Berriel-Valdos, Luis R.
Pedraza, Jorge
Vera-Marquina, Alicia
OPTICAL ENGINEERING, 2008, 47 (10)
[23] Fabrication of a nanoscale single-crystalline silicon thin film on insulator
Lee, T.-H.
Huang, C.-H.
Yang, Y.-Y.
Li, P.-W.
Suryasindhu, T.
Lee, S.
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2007, 10 (07) : K17 - K19
[24] Optimization and Fabrication of Amorphous silicon based TFT
Nagendra, Vinuth
Yedhuraj, S. R.
Subramanyam, T. K.
2016 IEEE INTERNATIONAL CONFERENCE ON RECENT TRENDS IN ELECTRONICS, INFORMATION & COMMUNICATION TECHNOLOGY (RTEICT), 2016, : 2002 - 2004
[25] CMOS Compatible Pinpointed Fabrication of Nanoscale Silicon Oxide Islands Array
Dai, Pengfei
Lu, Na
Gao, Anran
Wang, Yuein
Li, Tie
2015 SYMPOSIUM ON DESIGN, TEST, INTEGRATION AND PACKAGING OF MEMS/MOEMS (DTIP), 2015,
[26] Analysis of KOH etching of (100) silicon on insulator for the fabrication of nanoscale tips
J Vac Sci Technol B, 5 (2844):
[27] Fabrication of Uniform Nanoscale Cavities via Silicon Direct Wafer Bonding
Thomson, Stephen R. D.
Perron, Justin K.
Kimball, Mark O.
Mehta, Sarabjit
Gasparini, Francis M.
JOVE-JOURNAL OF VISUALIZED EXPERIMENTS, 2014, (83):
[28] Integrated nanoscale silicon sensors using top-down fabrication
Elibol, OH
Morisette, D
Akin, D
Denton, JP
Bashir, R
APPLIED PHYSICS LETTERS, 2003, 83 (22) : 4613 - 4615
[29] Analysis of KOH etching of (100) silicon on insulator for the fabrication of nanoscale tips
Yun, MH
Burrows, VA
Kozicki, MN
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (05): : 2844 - 2848
[30] Stepwise Fabrication and Optimization of Coplanar Waveguide Resonator Hybrid Devices
Kellner, Nicole
Huettner, Niklas
Will, Marco
Hakonen, Pertti
Huettel, Andreas K.
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 2023, 260 (12):

← 1 2 3 4 5 →