Measurement of creep and relaxation behaviors of wafer-level CSP assembly using Moire interferometry

被引:10
|
作者
Ham, SJ [1 ]
Lee, SB [1 ]
机构
[1] Korea Adv Inst Sci & Technol, CARE Elect Packaging Lab, Dept Mech Engn, Taejon 305701, South Korea
关键词
D O I
10.1115/1.1571571
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper the creep and relaxation behaviors of a wafer-level CSP assembly under two types of thermal loading conditions were investigated using high sensitivity moire interferometry. One is a thermal load from 100degreesC to room temperature and the other is from room temperature to 100degreesC. In the second case, the real-time technique was used to monitor and measure the shear deformations of solder joints and the warpage of the assembly during the test. For the real-time measurements of thermal deformations, a small-sized thermal chamber having an optical window was developed. In addition, the test results obtained from the moire interferometry measurements were compared with the predicted values obtained from finite element analysis. It is shown that the deformation values predicted from finite element analysis have a good agreement with those obtained from the tests.
引用
收藏
页码:282 / 288
页数:7
相关论文
共 50 条
  • [41] Optimization of Wafer-level TTV Using RIE Applied for the Extreme Wafer Thinning
    Li, Jinzhu
    Liu, Ziyu
    Wang, Wenchao
    Wang, Yang
    Chen, Lin
    Sun, Qingqing
    2023 24TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY, ICEPT, 2023,
  • [42] Electromigration noise measurements using a novel AC/DC wafer-level noise measurement system
    Yassine, AM
    Chen, CTM
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1997, 44 (01) : 180 - 184
  • [43] A Novel Design of Temporary Bond Debond Adhesive Technology for Wafer-Level Assembly
    Xu, Dingying
    Wang, Hsin-Wei
    Patel, Jigneshkumar
    Brun, Xavier F.
    Hirota, Kosuke
    Capsuto, Elliott
    Kato, Hideto
    Sugo, Michihiro
    2020 IEEE 70TH ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC 2020), 2020, : 68 - 74
  • [44] Wafer-Level Assembly of Physics Package for Chip-Scale Atomic Clocks
    Guo, Ping
    Meng, Hongling
    Dan, Lin
    Zhao, Jianye
    IEEE SENSORS JOURNAL, 2022, 22 (07) : 6387 - 6398
  • [45] MEASUREMENT OF BIAXIAL CREEP STRAINS USING MOIRE METHOD
    SODERQUI.B
    ACTA POLYTECHNICA SCANDINAVICA-PHYSICS INCLUDING NUCLEONICS SERIES, 1966, (43): : 5 - &
  • [46] Investigation of Solder Creep Behavior on Wafer Level CSP Under Thermal Cycling Loading
    Wu, Kai-Chiang
    Chiang, Kuo-Ning
    2014 INTERNATIONAL CONFERENCE ON ELECTRONICS PACKAGING (ICEP), 2014, : 498 - 501
  • [47] Moire-Based Absolute Interferometry With Large Measurement Range in Wafer-Mask Alignment
    Di, Chengliang
    Yan, Wei
    Hu, Song
    Yin, Didi
    Ma, Chifei
    IEEE PHOTONICS TECHNOLOGY LETTERS, 2015, 27 (04) : 435 - 438
  • [48] Angular measurement using moire interferometry for alignment of proximity lithography
    Tong, Junmin
    Zhou, Shaolin
    Zhao, Lixin
    Hu, Song
    Zhongguo Jiguang/Chinese Journal of Lasers, 2014, 41 (12):
  • [49] Stress measurement of composite joint with pinhole using moire interferometry
    Guo, Mingjie
    Xiao, Longxiu
    Fuhe Cailiao Xuebao/Acta Materiae Compositae Sinica, 1997, 14 (01): : 122 - 126
  • [50] Wafer-level BCB bonding using a thermal press for microfluidics
    Xiaodong Zhou
    Selven Virasawmy
    Chenggen Quan
    Microsystem Technologies, 2009, 15 : 573 - 580