Study of 200 MeV Ag15+ ion induced amorphisation in nickel ferrite thin films

被引：21

作者：

Dixit, Gagan ^{[1
]}

Singh, Jitendra Pal ^{[1
]}

Srivastava, R. C. ^{[1
]}

Agrawal, H. M. ^{[1
]}

机构：

[1] Govind Ballabh Univ Ag & Technol, Dept Phys, Pantnagar 263145, Uttarakhand, India

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2011年 / 269卷 / 02期

关键词：

Pulsed laser deposition; Thin films; Spinel structure; Irradiation; MAGNETIC-PROPERTIES; IRRADIATION; SUBSTITUTION; SPECTRA;

D O I：

10.1016/j.nimb.2010.10.011

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Thin films of nickel ferrite of thickness similar to 100 and 150 nm were deposited by pulsed laser deposition. The films were irradiated with a 200 MeV Ag15+ beam of three fluences 1 x 10(12), 2 x 10(12) and 4 x 10(12) ions/cm(2). X-ray diffraction showed a decrease in the intensity of peaks indicating progressive amorphisation with increased irradiation fluence. Fourier transform infra-red and Raman spectra of pristine and irradiated films were also recorded which showed a degradation of the crystallinity of the samples after irradiation. The damage cross section of the infra-red bands was determined. It was found that the two bands at 557 and 614 cm(-1) did not show similar behaviour with fluence. (C) 2010 Elsevier E.V. All rights reserved.

引用

页码：133 / 139

页数：7

共 50 条

[1] Amorphization of SiO2 Thin Films by Using 200 MeV Ag15+ Ions
Gaikwad, Anil
Mhaisagar, Yogesh
Gupta, Swati
Joshi, Bhavana
Asokan, Kandasami
Mahajan, Ashok
SILICON, 2019, 11 (02) : 1017 - 1021
[2] Effect of 200 MeV Ag15+ ion beam irradiation at different fluences on WO3 thin films
Rathika, R.
Kovendhan, M.
Joseph, D. Paul
Kumar, A. Sendil
Vijayarangamuthu, K.
Venkateswaran, C.
Asokan, K.
Jeyakumar, S. Johnson
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2019, 439 : 51 - 58
[3] Amorphization of SiO2 Thin Films by Using 200 MeV Ag15+ Ions
Anil Gaikwad
Yogesh Mhaisagar
Swati Gupta
Bhavana Joshi
Kandasami Asokan
Ashok Mahajan
Silicon, 2019, 11 : 1017 - 1021
[4] 200 MeV Ag15+ ion beam irradiation induced modifications in spray deposited MoO3 thin films by fluence variation
Rathika, R.
Kovendhan, M.
Joseph, D. Paul
Vijayarangamuthu, K.
Kumar, A. Sendil
Venkateswaran, C.
Asokan, K.
Jeyakumar, S. Johnson
NUCLEAR ENGINEERING AND TECHNOLOGY, 2019, 51 (08) : 1983 - 1990
[5] 200 MeV Ag15+ ion induced surface modification and transport behaviour in manganite based thin film devices
Ravalia, Ashish
Vagadia, Megha
Vachhani, P. S.
Choudhary, R. J.
Phase, D. M.
Asokan, K.
Kuberkar, D. G.
APPLIED SURFACE SCIENCE, 2012, 258 (09) : 4203 - 4206
[6] Evolution of magnetic pillars using 200 MeV Ag15+ ion irradiation
Kumar, Shalendra
Sharma, S. K.
Alimuddin
Choudhary, R. J.
Phase, D. M.
Kumar, Ravi
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2008, 266 (08): : 1741 - 1748
[7] Spin dynamics investigation in nanosized zinc ferrite irradiated with 200 MeV Ag15+ ions
Singh, Jitendra Pal
Dixit, Gagan
Pandey, Kamla
Kumar, Hemaunt
Srivastava, R. C.
Agrawal, H. M.
Asokan, K.
MATERIALS LETTERS, 2014, 122 : 277 - 280
[8] 200 MeV Ag15+ swift heavy ion beam induced property modifications in Nb2O5 thin films by fluence variation
Rathika, R.
Kovendhan, M.
Joseph, D. Paul
Vijayarangamuthu, K.
Kumar, A. Sendil
VenkatesWaran, C.
Asokan, K.
Jeyakumar, S. Johnson
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2019, 135
[9] Structural and Magnetic Characterizations of 200 MeV Ag15+ Irradiated BixCo2-xMnO4 Thin Films
Rajeevan, N. E.
Kumar, Ravi
Shukla, D. K.
Thakur, P.
Pradyumnan, P. P.
ADVANCED MULTIFUNCTIONAL ELECTROCERAMICS, 2013, 547 : 71 - +
[10] Solubility of Co clusters in Co-implanted ZnO thin films by 200 MeV Ag15+ ions irradiation
Khan, M. Wasi
Kumar, Ravi
Khan, M. A. Majeed
Angadi, Basavaraj
Jung, Y. S.
Choi, W. K.
Srivastava, J. P.
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2009, 24 (09)

← 1 2 3 4 5 →