Study of 200 MeV Ag15+ ion induced amorphisation in nickel ferrite thin films

被引：21

作者：

Dixit, Gagan ^{[1
]}

Singh, Jitendra Pal ^{[1
]}

Srivastava, R. C. ^{[1
]}

Agrawal, H. M. ^{[1
]}

机构：

[1] Govind Ballabh Univ Ag & Technol, Dept Phys, Pantnagar 263145, Uttarakhand, India

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2011年 / 269卷 / 02期

关键词：

Pulsed laser deposition; Thin films; Spinel structure; Irradiation; MAGNETIC-PROPERTIES; IRRADIATION; SUBSTITUTION; SPECTRA;

D O I：

10.1016/j.nimb.2010.10.011

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Thin films of nickel ferrite of thickness similar to 100 and 150 nm were deposited by pulsed laser deposition. The films were irradiated with a 200 MeV Ag15+ beam of three fluences 1 x 10(12), 2 x 10(12) and 4 x 10(12) ions/cm(2). X-ray diffraction showed a decrease in the intensity of peaks indicating progressive amorphisation with increased irradiation fluence. Fourier transform infra-red and Raman spectra of pristine and irradiated films were also recorded which showed a degradation of the crystallinity of the samples after irradiation. The damage cross section of the infra-red bands was determined. It was found that the two bands at 557 and 614 cm(-1) did not show similar behaviour with fluence. (C) 2010 Elsevier E.V. All rights reserved.

引用

页码：133 / 139

页数：7

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