Study of 200 MeV Ag15+ ion induced amorphisation in nickel ferrite thin films

被引：21
|
作者：
Dixit, Gagan [1 ]
Singh, Jitendra Pal [1 ]
Srivastava, R. C. [1 ]
Agrawal, H. M. [1 ]
机构：
[1] Govind Ballabh Univ Ag & Technol, Dept Phys, Pantnagar 263145, Uttarakhand, India
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2011年 / 269卷 / 02期
关键词：
Pulsed laser deposition; Thin films; Spinel structure; Irradiation; MAGNETIC-PROPERTIES; IRRADIATION; SUBSTITUTION; SPECTRA;
D O I：
10.1016/j.nimb.2010.10.011
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Thin films of nickel ferrite of thickness similar to 100 and 150 nm were deposited by pulsed laser deposition. The films were irradiated with a 200 MeV Ag15+ beam of three fluences 1 x 10(12), 2 x 10(12) and 4 x 10(12) ions/cm(2). X-ray diffraction showed a decrease in the intensity of peaks indicating progressive amorphisation with increased irradiation fluence. Fourier transform infra-red and Raman spectra of pristine and irradiated films were also recorded which showed a degradation of the crystallinity of the samples after irradiation. The damage cross section of the infra-red bands was determined. It was found that the two bands at 557 and 614 cm(-1) did not show similar behaviour with fluence. (C) 2010 Elsevier E.V. All rights reserved.
引用
收藏
页码：133 / 139
页数：7
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