Fabrication of Metallic Nanostructures of Sub-20 nm with an Optimized Process of E-Beam Lithography and Lift-Off

被引：8

作者：

Yue, Weisheng ^{[1
]}

Wang, Zhihong ^{[1
]}

Wang, Xianbin ^{[1
]}

Chen, Longqing ^{[1
]}

Yang, Yang ^{[1
]}

Chew, Basil ^{[1
]}

Syed, Ahad ^{[1
]}

Wong, Kim Chong ^{[1
]}

Zhang, Xixiang ^{[1
]}

机构：

[1] KAUST, Adv Nanofabricat & Imaging Core Lab, Thuwal 239556900, Saudi Arabia

来源：

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | 2012年 / 12卷 / 01期

关键词：

Metallic Nanostructure; E-Beam Lithography; Lift-Off; Surface Enhanced Raman Scattering (SERS); ENHANCED RAMAN-SCATTERING; SPECTROSCOPY; ARRAYS;

D O I：

10.1166/jnn.2012.5382

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A process consisting of e-beam lithography and lift-off was optimized to fabricate metallic nanostructures. This optimized process successfully produced gold and aluminum nanostructures with features size less than 20 nm. These structures range from simple parallel lines to complex photonic structures. Optical properties of gold split ring resonators (SRRs) were characterized with Raman spectroscopy. Surface-Enhanced Raman Scattering (SERS) on SRRs was observed with 4-mercaptopyridine (4-MPy) as molecular probe and greatly enhanced Raman scattering was observed.

引用

页码：696 / 699

页数：4

共 50 条

[41] Fabrication of thick Cr masks for reactive ion substrate etching by electron beam lithography and lift-off techniques
Wang, Deyong
Kristensen, Peter Kjaer
Chirumamilla, Manohar
Pedersen, Kjeld
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2024, 42 (06):
[42] Multiple pass exposure in e-beam lithography - Application to the sub-22nm nodes
Martin, L.
Manakli, S.
Icard, B.
Pradelles, J.
Orobtchouk, R.
Poncet, A.
Pain, L.
ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES II, 2010, 7637
[43] Process latitude for 100 nm dimensions for e-beam lithography in SAL-601
Dobisz, EA
Marrian, CRK
ELECTRON-BEAM, X-RAY, EUV, AND ION-BEAM SUBMICROMETER LITHOGRAPHIES FOR MANUFACTURING VI, 1996, 2723 : 383 - 392
[44] Fabrication of large scale arrays of metallic nanodots by means of high resolution e-beam lithography
Guzenko, Vitaliy A.
Ziegler, Joerg
Savouchkina, Anastasia
Padeste, Celestino
David, Christian
MICROELECTRONIC ENGINEERING, 2011, 88 (08) : 1972 - 1974
[45] Fabrication of single-layer metallic nano-gratings as polarisers by the combination of nanoimprint lithography and lift-off method
Wang, Qianyi
Chu, Jinkui
Wang, Zhiwen
Zhang, Huixia
Liu, Ze
Guan, Le
MICRO & NANO LETTERS, 2017, 12 (04) : 267 - 270
[46] Comparison between e-beam direct write and immersion lithography for 20-nm node
Brandt, Pieter
Sardana, Charu
Ibbotson, Dale
Wieland, Marco
Fay, Aurelien
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2015, 14 (03):
[47] Strain-facilitated process for the lift-off of a Si layer of less than 20 nm thickness
Shao, L
Lin, Y
Swadener, JG
Lee, JK
Jia, QX
Wang, YQ
Nastasi, M
Thompson, PE
Theodore, ND
Alford, TL
Mayer, JW
Chen, P
Lau, SS
APPLIED PHYSICS LETTERS, 2005, 87 (25) : 1 - 3
[48] Fabrication of SAW devices using SEM-based electron beam lithography and lift-off technique for lab use
Hatakeyama, H
Omori, T
Hashimoto, K
Yamaguchi, M
2004 IEEE ULTRASONICS SYMPOSIUM, VOLS 1-3, 2004, : 1896 - 1900
[49] Sub-100 nm trackwidth development by e-beam lithography for advanced magnetic recording heads
Chang, Jei-Wei
Chen, Chao-Peng
EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2, 2006, 6151 : U1388 - U1395
[50] Fabrication of roll mold using electron-beam direct writing and metal lift-off process
Maruyama, Hiroki
Unno, Noriyuki
Taniguchi, Jun
MICROELECTRONIC ENGINEERING, 2012, 97 : 113 - 116

← 1 2 3 4 5 →