共 50 条
- [21] Sub 100 nm T-gates utilizing a single e-beam lithography exposure process ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX, PTS 1 AND 2, 2002, 4690 : 1150 - 1156
- [22] Sub-20nm Hybrid Lithography using Optical plus Pitch-Division and e-Beam ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES IV, 2012, 8323
- [27] Manufacturing sub-50 nm gratings using e-beam lithography and electroplating EMERGING LITHOGRAPHIC TECHNOLOGIES VI, PTS 1 AND 2, 2002, 4688 : 922 - 931
- [29] Advanced Photomask Fabrication Process to Increase Pattern Reliability for sub-20 nm node PHOTOMASK TECHNOLOGY 2012, 2012, 8522
- [30] Fabrication of low grass, smooth sidewall InGaAsP by methane-hydrogen inductively coupled plasma RIE through a metal lift-off mask patterned by e-beam lithography JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2015, 33 (05):