共 50 条
- [12] Sub-10 nm monogranular metallic lines formed by 200 kV electron-beam lithography and lift-off in polymethylmethacrylate resist Microelectron Eng, 1-4 (253-256):
- [14] A study of the reproducibility of electron beam induced deposition for sub-20 nm lithography MICRO AND NANO ENGINEERING, 2019, 4 : 1 - 6
- [16] Improved process control of photomask fabrication in e-beam lithography 20TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, 2000, 4186 : 508 - 512
- [17] Hybrid E-beam lithography and process improvement for nanodevice fabrication PHOTOMASK TECHNOLOGY 2020, 2020, 11518
- [18] Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2014, 13 (03):