Organic contamination control in silicon surface processing

被引：3
|
作者：
Saga, K
Hattori, T
机构：
来源：
ULTRA CLEAN PROCESSING OF SILICON SURFACES VII | 2005年 / 103-104卷
关键词：
organic contamination; molecular contamination; GOI; TD-GC/MS; SCROD;
D O I：
10.4028/www.scientific.net/SSP.103-104.49
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：49 / 54
页数：6
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