Organic contamination control in silicon surface processing

被引：3
|
作者：
Saga, K
Hattori, T
机构：
来源：
ULTRA CLEAN PROCESSING OF SILICON SURFACES VII | 2005年 / 103-104卷
关键词：
organic contamination; molecular contamination; GOI; TD-GC/MS; SCROD;
D O I：
10.4028/www.scientific.net/SSP.103-104.49
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：49 / 54
页数：6
相关论文
共 50 条
  • [21] Silicon surface defects: The roles of passivation and surface contamination
    Reddy, AJ
    Burr, TA
    Chan, JK
    Norga, GJ
    Michel, J
    Kimerling, LC
    DEFECTS IN SEMICONDUCTORS - ICDS-19, PTS 1-3, 1997, 258-2 : 1719 - 1724
  • [22] Influence of organic contamination on silicon dioxide integrity
    Sugimoto, Fumitoshi
    Okamura, Sigeru
    Inokuma, Takao
    Kurata, Yoshihiro
    Hasegawa, Seiichi
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2000, 39 (5 A): : 2497 - 2502
  • [23] Silicon surface defects: The roles of passivation and surface contamination
    Reddy, Anand J.
    Burr, Tracey A.
    Chan, Julia K.
    Norga, Gerd J.
    Michel, Jurgen
    Kimerling, Lionel C.
    Materials Science Forum, 1997, 258-263 (pt 3): : 1719 - 1724
  • [24] Silicon contamination control by lifetime measurements
    Zoth, G
    Geyer, S
    Schulze, HJ
    ANALYTICAL AND DIAGNOSTIC TECHNIQUES FOR SEMICONDUCTOR MATERIALS, DEVICES, AND PROCESSES, 1999, 99 (16): : 5 - 20
  • [25] Aspects of silicon contamination control by lifetime
    Siemens AG, Semiconductors, Plant Regensburg, P.O.Box 100944, D-93009 Regensburg, Germany
    ASTM Special Technical Publication, 1998, (1340): : 30 - 44
  • [26] Aspects of silicon contamination control by lifetime
    Zoth, G
    RECOMBINATION LIFETIME MEASUREMENTS IN SILICON, 1998, 1340 : 30 - 44
  • [27] Gas velocity influence on silicon surface organic contamination evaluated using quartz crystal microbalance
    Habuka, H
    Tawada, M
    Takeuchi, T
    Aihara, M
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2005, 152 (11) : G862 - G866
  • [28] Time-dependent airborne organic contamination on silicon wafer surface stored in a plastic box
    Habuka, H
    Shimazaki, Y
    Okamura, S
    Sugimoto, F
    Takeuchi, T
    Aihara, M
    Shimada, M
    Okuyama, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (4A): : 1575 - 1580
  • [29] THE ROLE OF CONTAMINATION CONTROL IN VLSI PROCESSING
    TOLLIVER, DL
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1984, 187 (APR): : 99 - INDE
  • [30] MEASURES TO CONTROL CONTAMINATION IN PROCESSING PLANTS
    NIELSEN, VH
    AMERICAN DAIRY REVIEW, 1974, 36 (11): : 26 - +
12345