Organic contamination control in silicon surface processing

被引：3
|
作者：
Saga, K
Hattori, T
机构：
来源：
ULTRA CLEAN PROCESSING OF SILICON SURFACES VII | 2005年 / 103-104卷
关键词：
organic contamination; molecular contamination; GOI; TD-GC/MS; SCROD;
D O I：
10.4028/www.scientific.net/SSP.103-104.49
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：49 / 54
页数：6
相关论文
共 50 条
  • [31] CONTAMINATION OF THE SURFACE OF SILICON BY METALS DISSOLVED IN ETCHANTS
    OKAJIMA, Y
    OYAMA, S
    HACHINO, H
    NIPPON KAGAKU KAISHI, 1980, (12) : 1922 - 1923
  • [32] Control of organic contamination in CMOS manufacturing
    Bügler, J
    Frickinger, J
    Zielonka, G
    Pfitzner, L
    Ryssel, H
    Schottler, M
    IN-LINE CHARACTERIZATION, YIELD, RELIABILITY, AND FAILURE ANALYSIS IN MICROELECTRONIC MANUFACTURING II, 2001, 4406 : 82 - 91
  • [33] Hot water and organic acid interventions to control microbiological contamination on hog carcasses during processing
    Eggenberger-Solorzano, L
    Niebuhr, SE
    Acuff, GR
    Dickson, JS
    JOURNAL OF FOOD PROTECTION, 2002, 65 (08) : 1248 - 1252
  • [34] Influence of surface organic contamination on the incubation time in low-pressure chemical vapor deposition of silicon nitride on silicon substrates
    Saga, K
    Hattori, T
    SCIENCE AND TECHNOLOGY OF SEMICONDUCTOR SURFACE PREPARATION, 1997, 477 : 379 - 385
  • [35] The Impact Of Organic Contamination On The Oxide-Silicon Interface
    Codegoni, D.
    Polignano, M. L.
    Castellano, L.
    Borionetti, G.
    Bonoli, F.
    Nutsch, A.
    Leibold, A.
    Otto, M.
    FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2011, 2011, 1395
  • [36] TOTAL CONTAMINATION CONTROL MANAGEMENT IN SEMICONDUCTOR PROCESSING
    FUKUMOTO, T
    9TH INTERNATIONAL SYMPOSIUM ON CONTAMINATION CONTROL : EXPLORING WORLD PARTNERSHIPS IN TECHNOLOGY, 1988, : 12 - 17
  • [37] Chemical contamination control in ULSI wafer processing
    Hattori, T
    CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2000, INTERNATIONAL CONFERENCE, 2001, 550 : 275 - 284
  • [38] ADVANCES IN CONTAMINATION CONTROL OF PROCESSING CHEMICALS IN VLSI
    JULEFF, EM
    MCLEOD, WJ
    HULSE, EA
    FAWCETT, S
    SOLID STATE TECHNOLOGY, 1982, 25 (09) : 82 - 86
  • [39] CONTROL OF AIRBORNE CONTAMINATION IN DAIRY PROCESSING PLANTS
    VICKERS, VT
    NEW ZEALAND JOURNAL OF DAIRY SCIENCE AND TECHNOLOGY, 1986, 21 (02): : 89 - 98
  • [40] ELECTRICAL CHARACTERIZATION OF DEFECTS IN SILICON - GROWTH, PROCESSING, AND CONTAMINATION EFFECTS
    KIMERLING, LC
    JOURNAL OF ELECTRONIC MATERIALS, 1977, 6 (06) : 735 - 735
12345