Preparation of functionally gradient fluorocarbon polymer films by plasma polymerization of NF3 and propylene

被引:0
|
作者
Tasaka, A
Komura, A
Uchimoto, Y
Inaba, M
Ogumi, Z
机构
[1] KYOTO UNIV,GRAD SCH ENGN,DIV ENERGY & HYDROCARBON CHEM,SAKYO KU,KYOTO 60601,JAPAN
[2] DOSHISHA UNIV,FAC ENGN,DEPT MOLEC SCI & TECHNOL,TANABE,KYOTO 61003,JAPAN
关键词
plasma polymerization; fluorocarbon film; functionally gradient material; propylene; nitrogen trifluoride;
D O I
10.1002/(SICI)1099-0518(19960130)34:2<193::AID-POLA5>3.3.CO;2-T
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Fluorocarbon polymer films were prepared by plasma polymerization using nitrogen trifluoride (NF3) and propylene as starting materials. To improve their adhesiveness to substrates, a novel functionally gradient film in which the content of fluorine decreased continuously from the surface to the interior was prepared by changing source gas composition during deposition. This film had a smooth and pinhole-free surface, and had a high contact angle (110 degrees) for water drop. In addition, it showed good adhesion to a glass substrate. (C) 1996 John Wiley & Sons, Inc.
引用
收藏
页码:193 / 198
页数:6
相关论文
共 50 条
  • [21] Preparation and piezoelectricity of fluorocarbon polymer piezoelectret films with ordered void structure
    Sun Zhuan-Lan
    Zhang Xiao-Qing
    Cao Gong-Xun
    Wang Xue-Wen
    Xia Zhong-Fu
    ACTA PHYSICA SINICA, 2010, 59 (07) : 5061 - 5066
  • [22] Preparation of surface-rnodified carbonaceous thin-film electrodes by NF3 plasma and their electrochemical properties
    Fukutsuka, T
    Hasegawa, S
    Matsuo, Y
    Sugie, Y
    Abe, T
    Ogumi, Z
    JOURNAL OF POWER SOURCES, 2005, 146 (1-2) : 151 - 155
  • [23] MASS-SPECTROMETRIC TRANSIENT STUDY OF DC PLASMA-ETCHING OF SI IN NF3 AND NF3/O2 MIXTURES
    HONDA, T
    BRANDT, WW
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (11) : 2667 - 2670
  • [24] Microwave plasma torch abatement of NF3 and SF6
    Hong, YC
    Uhm, HS
    Chun, BJ
    Lee, SK
    Hwang, SK
    Kim, DS
    PHYSICS OF PLASMAS, 2006, 13 (03)
  • [25] A REACTOR FOR PLASMA POLYMERIZATION ON POLYMER-FILMS
    GERSTENBERG, KW
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 : 110 - 119
  • [26] Influence of fluorocarbon plasma polymer films on the growth of primary human fibroblasts
    Barz, Jakob
    Haupt, Michael
    Pusch, Kai
    Weimer, Michaela
    Oehr, Christian
    PLASMA PROCESSES AND POLYMERS, 2006, 3 (6-7) : 540 - 552
  • [27] Power dependence of NF3 plasma stability for in situ chamber cleaning
    Ji, B
    Elder, DL
    Yang, JH
    Badowski, PR
    Karwacki, EJ
    JOURNAL OF APPLIED PHYSICS, 2004, 95 (08) : 4446 - 4451
  • [28] METAL CONTAINING PLASMA POLYMERIZED FLUOROCARBON FILMS - THEIR SYNTHESIS, STRUCTURE AND POLYMERIZATION MECHANISM
    KAY, E
    DILKS, A
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1978, 176 (SEP): : 114 - 114
  • [29] PLASMA AND REAGENT PULSE INDUCED TRANSIENTS IN THE ETCHING OF SI BY NF3
    ISHII, I
    BRANDT, WW
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (06) : 1240 - 1242
  • [30] Influence of the electron kinetics on Ar/NF3 inductively coupled plasma
    Levko, Dmitry
    Raja, Laxminarayan L.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2022, 40 (04):