Residual layer-free Reverse Nanoimprint Lithography on silicon and metal-coated substrates

被引：16

作者：

Fernandez, Ariadna ^{[1
]}

Medina, Juan ^{[1
]}

Benkel, Christian ^{[2
]}

Guttmann, Markus ^{[2
]}

Bilenberg, Brian ^{[3
]}

Thamdrup, Lasse H. ^{[3
]}

Nielsen, Theodor ^{[3
]}

Sotomayor Torres, Clivia M. ^{[1
,4
]}

Kehagias, Nikolaos ^{[1
]}

机构：

[1] Catalan Inst Nanosci & Nanotechnol, Barcelona 08193, Spain

[2] KIT, Inst Microstruct Technol, D-76344 Eggenstein Leopoldshafen, Germany

[3] NIL Technol ApS, DK-2800 Lyngby, Denmark

[4] ICREA, Barcelona 08010, Spain

来源：

MICROELECTRONIC ENGINEERING | 2015年 / 141卷

关键词：

Nanoimprint Lithography; Injection molding; Functional surfaces; WENZEL WETTING TRANSITION; IMPRINT LITHOGRAPHY; POLYMER; SURFACES; ENERGY;

D O I：

10.1016/j.mee.2014.11.025

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this work we demonstrate-that Reverse Nanoimprint Lithography is a feasible and flexible lithography technique applicable to the transfer of micro and nano polymer structures with no residual layer over areas of cm(2) areas on silicon, metal and non-planar substrates. We used a flexible polydimethylsiloxane stamp with hydrophobic features. We present residual layer-free patterns imprinted using a commercial poly(methylmethacrylate) thermoplastic polymer over silicon, nickel and pre-patterned substrates. Our versatile patterning technology is adaptable to free form nano structuring and has coupling to adhesion technologies. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：56 / 61

页数：6

共 50 条

[21] Hybrid Soft Replica Molds for Residual Layer-Free Patterning
Nakamura, Yuri
Taniguchi, Jun
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2024, 37 (05) : 465 - 468
[22] Stamp deformation and its influence on residual layer homogeneity in thermal nanoimprint lithography
Merino, S.
Retolaza, A.
Schift, H.
Trabadelo, V.
MICROELECTRONIC ENGINEERING, 2008, 85 (5-6) : 877 - 880
[23] Trapping of hyaluronic acid molecule by metal-coated silicon nanotweezers
Mineta, Takashi
Takeuchi, Hiroko
Makino, Eiji
Hashiguchi, Gen
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2010, 9 (03):
[24] Microfabrication of metal-coated silicon tips and their field emission properties
Stephani, D.
Eibl, J.
Branston, D.W.
Bartsch, W.
Proceedings of the International Conference on Microlithography, 1991,
[25] Geometric dependence of metal-coated silicon nanowire plasmonic waveguides
Hwang, Yongsop
Park, Hong-Gyu
JOURNAL OF OPTICS, 2014, 16 (02)
[26] FIELD-EMISSION FROM METAL-COATED SILICON TIPS
BRANSTON, DW
STEPHANI, D
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (10) : 2329 - 2333
[27] MAGNETOELASTIC LOVE-WAVE PROPAGATION IN METAL-COATED LAYERED SUBSTRATES
VANDEVAA.H
JOURNAL OF APPLIED PHYSICS, 1971, 42 (13) : 5305 - &
[28] Electron mean-free path in metal-coated nanowires
Moroz, Alexander
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 2011, 28 (05) : 1130 - 1138
[29] Fabrication of ferroelectric polymer nanostructures on flexible substrates by soft-mold reverse nanoimprint lithography
Song, Jingfeng
Lu, Haidong
Li, Shumin
Tan, Li
Gruverman, Alexei
Ducharme, Stephen
NANOTECHNOLOGY, 2016, 27 (01)
[30] Optical Monitoring of a Poly(styrene) Residual Layer on a Photocrosslinkable Monolayer in Thermal Nanoimprint Lithography
Nagase, Koichi
Ohtake, Tomoyuki
Takaoka, Toshiaki
Kubo, Shoichi
Nakagawa, Masaru
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2009, 22 (02) : 201 - 204

← 1 2 3 4 5 →