Fabrication and characterization of reactively sputtered TaN thin-film resistors for millimeter wave applications

被引：11
|
作者：
Mellberg, A [1 ]
Nicols, SP [1 ]
Rorsman, N [1 ]
Zirath, H [1 ]
机构：
[1] Chalmers Univ Technol, Dept Microtechnol & Nanosci, Microwave Elect Lab, SE-41296 Gothenburg, Sweden
来源：
ELECTROCHEMICAL AND SOLID STATE LETTERS | 2004年 / 7卷 / 11期
关键词：
D O I：
10.1149/1.1804985
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
A tantalum nitride (TaN) thin-film resistor (TFR) lift-off process was developed by reactively sputtering TaN from a pure Ta metal target. The films were deposited at a rate of approximately 3 angstrom/s using a N-2/Ar ratio of 0.22 at 5 mTorr and 100 W of dc power. TFRs were fabricated on silicon and semi-insulating InP with reproducible resistances of 80-85 Omega/square at thicknesses of 550-700 angstrom using a lift-off technique. Resistors fabricated on semi-insulating InP utilizing microstrip technology were characterized by S-parameter measurements up to 67 GHz. A model, based on a lossy transmission line, described the TFRs with good accuracy. (C) 2004 The Electrochemical Society.
引用
收藏
页码：G261 / G263
页数：3
相关论文
共 50 条
  • [41] LASER TRIMMING OF NICR THIN-FILM RESISTORS .1. THIN-FILM RESISTORS WITHOUT A PROTECTIVE LAYER
    SCHULTZE, V
    FISCHER, A
    THIN SOLID FILMS, 1989, 182 : 23 - 33
  • [42] Sputtered Modified Barium Titanate for Thin-Film Capacitor Applications
    Reynolds, Glyn J.
    Kratzer, Martin
    Dubs, Martin
    Felzer, Heinz
    Mamazza, Robert
    MATERIALS, 2012, 5 (04): : 575 - 589
  • [43] REACTIVELY SPUTTERED TANTALUM THIN FILM RESISTORS .2. LOW ENERGY, LOLOW FLUENCE PROTON RADIATION DAMAGE
    SHEWCHUN, J
    HARDY, WR
    KUENZIG, D
    TAM, C
    THIN SOLID FILMS, 1971, 8 (02) : 101 - &
  • [44] Fabrication and characterization of thin film Ni-Cr resistors on MMICs
    Alim, Mohammad A.
    Rezazadeh, Ali A.
    Kyabaggu, Peter B. K.
    Krishnamurthy, L.
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2020, 35 (03)
  • [45] FABRICATION OF RF REACTIVELY SPUTTERED TiN THIN FILMS.
    Kumar, N.
    Pourrezaei, K.
    Fissel, M.
    Begley, T.
    Lee, B.
    Douglas, E.C.
    Semiconductor International, 1987, 10 (05) : 100 - 104
  • [46] Failure Analysis of TaN Thin Film Resistors for Microwave Circuits
    Cao, Qiantao
    Song, Zhiming
    Wang, Fei
    Wang, Bin
    Song, Zhenguo
    Hu, Yinglu
    PROCEEDINGS OF THE 2013 20TH IEEE INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITS (IPFA 2013), 2013, : 749 - 753
  • [47] Fabrication and characterization of RF sputtered ZnO thin film based phototransistors for UV detection applications
    Victoria, K. R. Ram
    Vasuki, S.
    OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, 2021, 15 (7-8): : 341 - 347
  • [48] Thin-film resistor fabrication for InP technology applications
    Kopf, RF
    Melendes, R
    Jacobson, D
    Tate, A
    Melendes, MA
    Reyes, RR
    Hamm, RA
    Yang, Y
    Frackoviak, J
    Weimann, NG
    Maynard, HL
    Liu, CT
    STATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS (SOTAPOCS XXXV), 2001, 2001 (20): : 81 - 86
  • [49] Thin-film resistor fabrication for InP technology applications
    Kopf, RF
    Melendes, R
    Jacobson, DC
    Tate, A
    Melendes, MA
    Reyes, RR
    Hamm, RA
    Yang, Y
    Frackoviak, J
    Weimann, NG
    Maynard, HL
    Liu, CT
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (03): : 871 - 875
  • [50] Effects of Substrate Bias on the Hardness and Resistivity of Reactively Sputtered TaN and TiN Thin Films
    Junqing Lu
    Nishat Arshi
    JOM, 2016, 68 : 1634 - 1639
12345