FABRICATION OF RF REACTIVELY SPUTTERED TiN THIN FILMS.

被引：0
|
作者：
Kumar, N. [1 ]
Pourrezaei, K. [1 ]
Fissel, M. [1 ]
Begley, T. [1 ]
Lee, B. [1 ]
Douglas, E.C. [1 ]
机构：
[1] Drexel Univ, Philadelphia, PA, USA, Drexel Univ, Philadelphia, PA, USA
来源：
Semiconductor International | 1987年 / 10卷 / 05期
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摘要：
10
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页码：100 / 104
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