FABRICATION OF RF REACTIVELY SPUTTERED TiN THIN FILMS.

被引：0
|
作者：
Kumar, N. [1 ]
Pourrezaei, K. [1 ]
Fissel, M. [1 ]
Begley, T. [1 ]
Lee, B. [1 ]
Douglas, E.C. [1 ]
机构：
[1] Drexel Univ, Philadelphia, PA, USA, Drexel Univ, Philadelphia, PA, USA
来源：
Semiconductor International | 1987年 / 10卷 / 05期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
10
引用
收藏
页码：100 / 104
相关论文
共 50 条
  • [21] REACTIVELY SPUTTERED VANADIUM DIOXIDE THIN FILMS
    FULS, EN
    HENSLER, DH
    ROSS, AR
    APPLIED PHYSICS LETTERS, 1967, 10 (07) : 199 - &
  • [22] Characterization of rf-sputtered indium tin oxide thin films
    Bhatti, MT
    Rana, AM
    Khan, AF
    MATERIALS CHEMISTRY AND PHYSICS, 2004, 84 (01) : 126 - 130
  • [23] PERMEABILITY OF SPUTTERED CoNbTi THIN FILMS.
    Yamamoto, M.
    Zhang, J.
    Morita, H.
    Fujimori, H.
    IEEE translation journal on magnetics in Japan, 1984, TJMJ-1 (06): : 752 - 753
  • [24] Effect of substrate temperature on the electrical and optical properties of reactively evaporated tin oxide thin films.
    Raghupathi, PS
    George, J
    Menon, CS
    INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 2005, 43 (08) : 620 - 623
  • [25] RF REACTIVELY SPUTTERED TIN - CHARACTERIZATION AND ADHESION TO MATERIALS OF TECHNICAL INTEREST
    BUCHER, JP
    ACKERMANN, KP
    BUSCHOR, FW
    THIN SOLID FILMS, 1984, 122 (01) : 63 - 71
  • [26] GAS SENSING CHARACTERISTICS OF REACTIVELY SPUTTERED SnO2 FILMS.
    Kuriki, Shinya
    Sano, Katsumasa
    Konishi, Hajime
    Matsumoto, Goro
    Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi), 1987, 70 (04): : 54 - 64
  • [27] STRUCTURE AND MAGNETIC-PROPERTIES OF RF REACTIVELY SPUTTERED IRON NITRIDE THIN-FILMS
    CHANG, C
    SIVERTSEN, JM
    JUDY, JH
    IEEE TRANSACTIONS ON MAGNETICS, 1987, 23 (05) : 3636 - 3638
  • [28] INVESTIGATION OF REACTIVELY SPUTTERED TIN FILMS FOR DIFFUSION-BARRIERS
    KANAMORI, S
    THIN SOLID FILMS, 1986, 136 (02) : 195 - 214
  • [29] Physical and morphological characterization of reactively magnetron sputtered TiN films
    Vaz, F
    Machado, P
    Rebouta, L
    Mendes, JA
    Lanceros-Méndez, S
    Cunha, L
    Nascimento, SMC
    Goudeau, P
    Rivière, JP
    Alves, E
    Sidor, A
    THIN SOLID FILMS, 2002, 420 : 421 - 428
  • [30] Temperature dependence of the electrical resistivity of reactively sputtered TiN films
    Tsai, W.
    Delfino, M.
    Fair, J.A.
    Hodul, D.
    Journal of Applied Physics, 1993, 73 (09):
12345