Synthesis and characterization of negative-type photosensitive polyimides for TFT-LCD array

Two different negative-type photosensitive polyimides were synthesized and characterized for an application as an interdielectric layer in TFT-LCD arraly. In the case of photocurable Polyimides, the photosensitive moiety, 2-HHSP, was synthesized through 3 step reaction, and then it-as incorporated into side chains of polyimide precursor by post reaction. Optimum compositions of negative-type photocurable polyimide were also formulated for photopolymerizable polyimides, two novel UV monomers containing imide linkages were prepared An aqueous alkaline developable polymer matrix was synthesized by free radical copolymerization. A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix, It was found that via-holes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.