Synthesis and characterization of negative-type photosensitive polyimides for TFT-LCD array

被引：0
|
作者：
Kim, Hyo-Jin [1 ]
Kim, Hyun Suk [1 ]
Kim, Soon Hak [1 ]
Park, Lee Soon [1 ]
Hur, Younghune
Lee, Yoon Soo
Song, Gab Deuk
Kwon, Younghwan
机构：
[1] Kyungpook Natl Univ, Dept Polymer Sci, Taegu 702701, South Korea
来源：
IMID/IDMC 2006: THE 6TH INTERNATIONAL MEETING ON INFORMATION DISPLAY/THE 5TH INTERNATIONAL DISPLAY MANUFACTURING CONFERENCE, DIGEST OF TECHNICAL PAPERS | 2006年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Two different negative-type photosensitive polyimides were synthesized and characterized for an application as an interdielectric layer in TFT-LCD arraly. In the case of photocurable Polyimides, the photosensitive moiety, 2-HHSP, was synthesized through 3 step reaction, and then it-as incorporated into side chains of polyimide precursor by post reaction. Optimum compositions of negative-type photocurable polyimide were also formulated for photopolymerizable polyimides, two novel UV monomers containing imide linkages were prepared An aqueous alkaline developable polymer matrix was synthesized by free radical copolymerization. A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix, It was found that via-holes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.
引用
收藏
页码：1625 / 1628
页数：4
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