Thermal NF3 fluorination/oxidation of cobalt, yttrium, zirconium, and selected lanthanide oxides

被引:16
|
作者
Scheele, Randall D. [1 ]
McNamara, Bruce K. [1 ]
Casella, Andrew M. [1 ]
Kozelisky, Anne E. [1 ]
Neiner, Doinita [1 ]
机构
[1] Pacific NW Natl Lab, Richland, WA 99352 USA
基金
美国能源部;
关键词
Nitrogen trifluoride; Fluorination; Used nuclear fuel reprocessing; Fluoride volatility; Transition metal oxides; Thermoanalysis; HAFNIUM OXIDES; GAS; FUELS; METAL;
D O I
10.1016/j.jfluchem.2012.12.013
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
We present results of our continued investigation into the use of nitrogen trifluoride (NF3) as the fluorinating agent in fluoride volatility-based reprocessing of used nuclear fuel, and as the fluorinating agent for oxides of cobalt and the lanthanides higher than gadolinium. The fundamental purpose of our studies is to determine if differences in constituent fission product and actinide fluorides' volatilities and reaction temperatures with NF3 at which volatile fluorides form can be exploited to provide desired separations. This paper supplements our previously reported results on constituents that can form volatile fluorides or oxyfluorides with results on constituents that should not form volatile fluorides or oxyfluorides. Cumulatively, our studies showed that rates of reaction of surrogate fuel constituent, cobalt, and the higher non-fission product lanthanide oxides with NF3 are highly temperature sensitive and depend significantly on the element with the higher lanthanides proving to be the most resistant to reaction. The thermodynamic calculations showed that NF3 should completely fluorinate the tested transition metal and lanthanide oxides to their fluorides. Simultaneous thermogravimetric and differential thermal analyses showed that NF3 converts the oxides of cobalt, zirconium, yttrium, and the lanthanides to non-volatile fluorides or oxyfluorides up to 550 degrees C and most importantly can extract the volatile fluoride-forming uranium, the bulk constituent in used nuclear fuel, from the non-volatile fluoride forming gadolinium. Overall these investigations demonstrate that NF3 can fluorinate used nuclear fuel constituent oxides, cobalt (II) oxide, and higher lanthanide oxides but with an effectiveness depending on the constituent metal. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:86 / 97
页数:12
相关论文
共 50 条
  • [41] REACTION OF NF3 AND SF6 WITH SOME OXIDES CONNECTED WITH HEAVY-METAL FLUORIDE GLASS PROCESSING
    BROER, MM
    ATKINS, RM
    JOURNAL OF MATERIALS RESEARCH, 1988, 3 (04) : 755 - 760
  • [42] Porous silicon light emission enhancement by NF3/UV photo-thermal surface treatment
    Stolyarova, S
    El-Bahar, A
    Nemirovsky, Y
    ELECTRO-OPTICS AND MICROELECTRONICS, PROCEEDINGS, 2000, 14 : 232 - 235
  • [43] N/F co-doped carbon nanocages engineered with NF3 fluorination for use in highly stable potassium-ion batteries
    Ha, Seongmin
    Choi, Go Bong
    Lim, Chaehun
    Myeong, Seongjae
    Cheon, Seoyeong
    Lee, Young-Seak
    CARBON LETTERS, 2025,
  • [44] FAST GROWTH OF THIN GATE DIELECTRICS BY THERMAL-OXIDATION OF SI IN N2O GAS AMBIENT WITH LOW CONCENTRATION OF NF3 ADDITION
    HUANG, JG
    JACCODINE, RJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (02) : L15 - L16
  • [45] NF3 and F2 gas fluorination of GaN surface and Pt/GaN interface analyzed by hard X-ray photoelectron spectroscopy
    Matsuda, Asahiko
    Teramoto, Takashi
    Nagata, Takahiro
    Gerlach, Dominic
    Shen, Peng
    Ueda, Shigenori
    Kimura, Takako
    Dussarrat, Christian
    Chikyow, Toyohiro
    APPLIED SURFACE SCIENCE, 2024, 659
  • [46] ACTUAL FLUORINATION OF Y-BA-CU-O HIGH-TC SUPERCONDUCTORS BY A SOLID-GAS REACTION UNDER NF3 FLOW
    PERRIN, C
    PENA, O
    SERGENT, M
    CHRISTENSEN, P
    FONTENEAU, G
    LUCAS, J
    SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 1989, 2 (01): : 35 - 42
  • [47] THIN FLUORINATED GATE DIELECTRICS GROWN BY RAPID THERMAL-PROCESSING IN O2 WITH DILUTED NF3
    LO, GQ
    TING, W
    AHN, JH
    KWONG, DL
    KUEHNE, J
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1992, 39 (01) : 148 - 153
  • [48] WO3 and W Thermal Atomic Layer Etching Using "Conversion-Fluorination" and "Oxidation-Conversion-Fluorination" Mechanisms
    Johnson, Nicholas R.
    George, Steven M.
    ACS APPLIED MATERIALS & INTERFACES, 2017, 9 (39) : 34435 - 34447
  • [49] DEEP OXIDATION OF BENZENE OVER GAMMA-AL2O3-SUPPORTED LANTHANIDE OXIDES
    HSU, BY
    LI, W
    JOURNAL OF THE LESS-COMMON METALS, 1985, 112 (1-2): : 343 - 346
  • [50] MOS CHARACTERISTICS OF FLUORINATED GATE DIELECTRICS GROWN BY RAPID THERMAL-PROCESSING IN O-2 WITH DILUTED NF3
    LO, GQ
    TING, W
    KWONG, DL
    KUEHNE, J
    MAGEE, CW
    IEEE ELECTRON DEVICE LETTERS, 1990, 11 (11) : 511 - 513