A new role for e-beam: electron projection

被引：5
|
作者：
Harriott, LR [1 ]
机构：
[1] AT&T Bell Labs, Lucent Technol, Adv Lithog Res Dept, Murray Hill, NJ 07974 USA
来源：
IEEE SPECTRUM | 1999年 / 36卷 / 07期
关键词：
Cost effectiveness - Electron beam lithography - Electron scattering - Image processing - Imaging techniques - Masks - Photoresists;
D O I：
10.1109/6.774964
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Lucent Technologies is currently developing a project electron beam system for the 100-nm generation. The system, called Scalpel, uses a beam 1 mm2 across along with a scattering contrast mask and a combination of scanning and stepping for a marked improvement in throughput.
引用
收藏
页码：41 / 45
页数：5
相关论文
共 50 条
  • [31] New microscopic approach to e-beam lithography simulation
    Sidorov, Fedor
    Rogozhin, Alexander
    2020 VI INTERNATIONAL CONFERENCE ON INFORMATION TECHNOLOGY AND NANOTECHNOLOGY (IEEE ITNT-2020), 2020,
  • [32] ADVANCES FIRE NEW INTEREST IN E-BEAM EVAPORATION
    COMELLO, V
    R&D MAGAZINE, 1994, 36 (01): : 58 - 59
  • [33] FREE-ELECTRON LASERS - E-BEAM EFFECT COULD LEAD TO NEW CLASS OF FELS
    HIGGINS, TV
    LASER FOCUS WORLD, 1993, 29 (01): : 34 - 34
  • [34] Enhanced E-beam pattern writing for nano-optics based on character projection
    Kley, E. -Bernhard
    Schmidt, Holger
    Zeitner, Uwe
    Banasch, Michael
    Schnabel, Bernd
    28TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, 2012, 8352
  • [35] Completion of the β tool and the recent progress of low energy e-beam proximity projection lithography
    Endo, A
    Higuchi, A
    Nozue, H
    Shimazu, N
    Fukui, T
    Yasumitsu, N
    Miyatake, T
    Anazawa, N
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (01): : 311 - 315
  • [36] ELECTRON-ENERGY DISTRIBUTIONS IN AN E-BEAM INITIATED XENON PLASMA
    GREENE, AE
    ELLIOTT, CJ
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1976, 21 (02): : 155 - 155
  • [37] IN-THE-LENS ELECTRON SPECTROMETERS FOR E-BEAM TESTING: A REVIEW.
    Garth, S.C.J.
    Microelectronic Engineering, 1987, 6 (1-4) : 667 - 672
  • [38] Illuminating E-Beam Processing
    McHugh, Tara
    Carswell, Lindsay
    FOOD TECHNOLOGY, 2017, 71 (01) : 64 - 66
  • [39] E-BEAM SYSTEM METROLOGY
    SILLS, RM
    STANDIFORD, KP
    SOLID STATE TECHNOLOGY, 1983, 26 (09) : 191 - 196
  • [40] Advances in E-beam metrology
    Harris, Karl, 1600, (32):
12345