Advances in E-beam metrology

被引：0
|
作者：
机构：
[1] Harris, Karl
来源：
Harris, Karl | 1600年 / 32期
关键词：
E-Beam Metrology - Feature Sizes - Linewidths - Spatial Metrology;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] ADVANCES IN E-BEAM METROLOGY
    HARRIS, K
    SOLID STATE TECHNOLOGY, 1989, 32 (01) : 100 - 101
  • [2] Special Section Guest Editorial: Advances in E-Beam Metrology
    Lorusso, Gian Francesco
    Mack, Chris A.
    JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 2023, 22 (02):
  • [3] E-BEAM SYSTEM METROLOGY
    SILLS, RM
    STANDIFORD, KP
    SOLID STATE TECHNOLOGY, 1983, 26 (09) : 191 - 196
  • [4] Trends in e-beam Metrology and Inspection
    Lorusso, Gian Francesco
    METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII, 2024, 12955
  • [5] The future of e-beam metrology: obstacles and opportunities
    Joy, DC
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVI, PTS 1 & 2, 2002, 4689 : 1 - 10
  • [6] In-line E-beam Metrology and Defect Inspection: Industry Reflections, Hybrid E-beam Opportunities, Recommendations and Predictions
    Solecky, Eric
    Rasafar, Allen
    Cantone, Jason
    Bunday, Benjamin
    Vaid, Alok
    Patterson, Oliver
    Stamper, Andrew
    Wu, Kevin
    Buengener, Ralf
    Weng, Weihao
    Dai, Xintuo
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXI, 2017, 10145
  • [7] E-beam metrology-based EUVL aberration monitoring
    Kang, Seulki
    Miura, Yuji
    Maruyama, Kotaro
    Yamazaki, Yuichiro
    Wei, Chih-, I
    Maguire, Ethan
    Fenger, Germain
    De Bisschop, Peter
    Das, Sayantan
    Halder, Sandip
    Lorusso, Gian
    METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVI, 2022, 12053
  • [8] e-beam metrology of thin resist for high NA EUVL
    Lorusso, Gian Francesco
    De Simone, Danilo
    Zidan, Mohamed
    Severi, Joren
    Moussa, Alain
    Dey, Bappaditya
    Halder, Sandip
    Goldenshtein, Alex
    Houchens, Kevin
    Santoro, Gaetano
    Fischer, Daniel
    Muellender, Angelika
    Mack, Chris
    Kondo, Tsuyoshi
    Shohjoh, Tomoyasu
    Ikota, Masami
    Charley, Anne-Laure
    De Gendt, Stefan
    Leray, Philippe
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2023, 62 (SG)
  • [9] Stable e-beam metrology on ArF resist for advanced process control
    Ke, CM
    Yen, A
    Yee, J
    Chu, M
    Fu, S
    Huang, E
    Yeh, D
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX, PTS 1 AND 2, 2002, 4690 : 598 - 605
  • [10] Monte Carlo model of charging in resists in e-beam lithography and metrology
    Ko, YU
    Hwu, JJ
    Joy, DC
    MICROBEAM ANALYSIS 2000, PROCEEDINGS, 2000, (165): : 283 - 284
12345