A new role for e-beam: electron projection

被引：5
|
作者：
Harriott, LR [1 ]
机构：
[1] AT&T Bell Labs, Lucent Technol, Adv Lithog Res Dept, Murray Hill, NJ 07974 USA
来源：
IEEE SPECTRUM | 1999年 / 36卷 / 07期
关键词：
Cost effectiveness - Electron beam lithography - Electron scattering - Image processing - Imaging techniques - Masks - Photoresists;
D O I：
10.1109/6.774964
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Lucent Technologies is currently developing a project electron beam system for the 100-nm generation. The system, called Scalpel, uses a beam 1 mm2 across along with a scattering contrast mask and a combination of scanning and stepping for a marked improvement in throughput.
引用
收藏
页码：41 / 45
页数：5
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