Post-pinch generation of electron beam in a low energy Mather-type plasma focus device

被引:4
|
作者
Behbahani, R. A. [1 ]
Aghamir, F. M. [1 ]
机构
[1] Univ Tehran, Dept Phys, Tehran 14399, Iran
关键词
X-RAY-EMISSION; OPTIMIZATION; LENGTH; NEON;
D O I
10.1017/S0022377813000470
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The post-pinch generation of electron beam in a low energy Mather-type plasma focus (PF) device has been investigated. A fast-calibrated Rogowski coil was used to monitor the emission of electron beam. A two-channel diode X-ray spectrometer along with suitable filters provided the records of energy spectrum of X-ray radiation. Single time-period emissions of electron beam with duration of 100 to 20 ns were recorded in the high range of the device operating pressure (0.82-mbar). However, in the low range regime (0.2-0.8 mbar), occurrence of single spike electron beam with duration of 150 +/- 50 ns, as well as multi-emission of electrons with duration of 400 +/- 50 ns, was visible. A multi-peak of tube voltage along with multi-time-period radiation of X-rays dominated by copper lines (Cuk(alpha) and Cuk(beta)) was noticeable in the low-pressure range. The generated electron beam during the post-pinch phase of anomalous resistances is suspected to be the main source of X-ray radiation. This can also be related to the turbulence of the plasma column during the occurrence of anomalous resistances.
引用
收藏
页码:777 / 782
页数:6
相关论文
共 50 条
  • [21] Effect of the insulator length on Mather-type plasma focus devices
    Yousefi, H. R.
    Aghamir, F. M.
    Masugata, K.
    PHYSICS LETTERS A, 2007, 361 (4-5) : 360 - 363
  • [22] Using Mather-type plasma focus device for surface modification of AISI304 Steel
    Al-Hawat, Sh.
    Soukieh, M.
    Abou Kharoub, M.
    Al-Sadat, W.
    VACUUM, 2010, 84 (07) : 907 - 912
  • [23] Plasma electron temperature measurement in a Mather-type plasma focus filled with hydrogen by a continuum intensity analysis
    Asif, M
    Xu, GS
    PLASMA DEVICES AND OPERATIONS, 2004, 12 (01): : 31 - 38
  • [24] A SCALING LAW FOR MACROSCOPIC STABILITY OF THE MATHER-TYPE PLASMA-FOCUS
    GERDIN, G
    VENNERI, F
    BOULAIS, K
    PLASMA PHYSICS AND CONTROLLED FUSION, 1989, 31 (09) : 1341 - 1363
  • [25] Low-Energy Plasma Focus Device as an Electron Beam Source
    Khan, Muhammad Zubair
    Ling, Yap Seong
    Yaqoob, Ibrar
    Kumar, Nitturi Naresh
    Kuang, Lim Lian
    San, Wong Chiow
    SCIENTIFIC WORLD JOURNAL, 2014,
  • [26] Diagnostics of Ion Beam Generated From A Mather Type Plasma Focus Device
    Lim, L. K.
    Ngoi, S. K.
    Wong, C. S.
    Yap, S. L.
    FRONTIERS IN PHYSICS, 2014, 1588 : 181 - 184
  • [27] Electron Temperature Measurement Using PIN Diodes as Detectors to Record the X-ray Pulses from a Low-Energy Mather-Type Plasma Focus
    M.Asif
    Amna Ikram
    Plasma Science & Technology, 2004, (02) : 2199 - 2203
  • [28] Electron temperature measurement using PIN diodes as detectors to record the X-ray pulses from a low-energy Mather-type plasma focus
    Asif, M
    Ikram, A
    PLASMA SCIENCE & TECHNOLOGY, 2004, 6 (02) : 2199 - 2203
  • [29] Study on electron beam emission from a low energy plasma focus device
    Neog, N. K.
    Mohanty, S. R.
    PHYSICS LETTERS A, 2007, 361 (4-5) : 377 - 381
  • [30] Carburizing of zirconium using a low energy Mather type plasma focus
    Murtaza, Ghulam
    Hussain, S. S.
    Rehman, N. U.
    Naseer, S.
    Shafiq, M.
    Zakaullah, M.
    SURFACE & COATINGS TECHNOLOGY, 2011, 205 (8-9): : 3012 - 3019