Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography

被引：0
|
作者：
Wachulak, P. W. [1 ]
Capeluto, M. G. [2 ]
Patel, D. [1 ]
Marconi, M. C. [1 ]
Menoni, C. S. [1 ]
Rocca, J. J. [1 ]
机构：
[1] Colorado State Univ, NSF, ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA
[2] Univ Buenos Aires, Fac Ciencias Exactas, Dept Fis, RA-1053 Buenos Aires, DF, Argentina
来源：
2007 IEEE LEOS ANNUAL MEETING CONFERENCE PROCEEDINGS, VOLS 1 AND 2 | 2007年
关键词：
D O I：
10.1109/LEOS.2007.4382491
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top lambda=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose.
引用
收藏
页码：486 / +
页数：2
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