Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography

被引：0

作者：

Wachulak, P. W. ^{[1
]}

Capeluto, M. G. ^{[2
]}

Patel, D. ^{[1
]}

Marconi, M. C. ^{[1
]}

Menoni, C. S. ^{[1
]}

Rocca, J. J. ^{[1
]}

机构：

[1] Colorado State Univ, NSF, ERC Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA

[2] Univ Buenos Aires, Fac Ciencias Exactas, Dept Fis, RA-1053 Buenos Aires, DF, Argentina

来源：

2007 IEEE LEOS ANNUAL MEETING CONFERENCE PROCEEDINGS, VOLS 1 AND 2 | 2007年

关键词：

D O I：

10.1109/LEOS.2007.4382491

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top lambda=46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose.

引用

页码：486 / +

页数：2

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