Fabrication of Junction Field-Effect Transistors on a Flexible Substrate by Using Hydrogenated Amorphous Silicon

被引:1
|
作者
Lovecchio, Nicola [1 ]
Caputo, Domenico [1 ]
de Cesare, Giampiero [1 ]
机构
[1] Sapienza Univ Rome, Dept Informat Engn Elect & Telecommun, Rome, Italy
关键词
flexible electronics; thin-film junction field effect transistors; amorphous silicon films; analogue electronics on flexible substrates; RECENT PROGRESS;
D O I
10.1109/IWASI58316.2023.10164389
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, we report on the fabrication and electrical characterization of junction field-effect transistors (JFETs) on flexible substrates for analogue electronics. The JFETs were realized using hydrogenated amorphous silicon (a-Si:H) as the semiconductor active material and a polyimide film as the flexible substrate. The devices were fabricated by using standard microelectronic technologies. The electrical characterization of the JFETs shows that the devices exhibit good performance in terms of output characteristics, making them suitable for the realization of low-power analog circuits.
引用
收藏
页码:277 / 280
页数:4
相关论文
共 50 条
  • [22] PHYSICS OF AMORPHOUS-SILICON BASED ALLOY FIELD-EFFECT TRANSISTORS
    SHUR, M
    HACK, M
    JOURNAL OF APPLIED PHYSICS, 1984, 55 (10) : 3831 - 3842
  • [23] HIGH-PERFORMANCE AMORPHOUS-SILICON FIELD-EFFECT TRANSISTORS
    MATSUMURA, M
    NARA, Y
    JOURNAL OF APPLIED PHYSICS, 1980, 51 (12) : 6443 - 6444
  • [24] THE CHARACTERISTICS AND PROPERTIES OF OPTIMIZED AMORPHOUS-SILICON FIELD-EFFECT TRANSISTORS
    MACKENZIE, KD
    SNELL, AJ
    FRENCH, I
    LECOMBER, PG
    SPEAR, WE
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1983, 31 (02): : 87 - 92
  • [25] TEMPERATURE-DEPENDENT EFFECTS IN FIELD-EFFECT MEASUREMENTS ON HYDROGENATED AMORPHOUS SILICON THIN-FILM TRANSISTORS.
    Schumacher, R.
    Thomas P.
    Weber, K.
    Fuhs, W.
    Djamdji, F.
    Le Comber, P.G.
    Schropp, R.E.I.
    Philosophical Magazine B: Physics of Condensed Matter; Electronic, Optical and Magnetic Properties, 1988, 58 (04): : 389 - 409
  • [26] TEMPERATURE-DEPENDENT EFFECTS IN FIELD-EFFECT MEASUREMENTS ON HYDROGENATED AMORPHOUS-SILICON THIN-FILM TRANSISTORS
    SCHUMACHER, R
    THOMAS, P
    WEBER, K
    FUHS, W
    DJAMDJI, F
    LECOMBER, PG
    SCHROPP, REI
    PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1988, 58 (04): : 389 - 409
  • [27] THE EFFECT OF GAMMA-IRRADIATION ON AMORPHOUS-SILICON FIELD-EFFECT TRANSISTORS
    FRENCH, ID
    SNELL, AJ
    LECOMBER, PG
    STEPHEN, JH
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1983, 31 (01): : 19 - 22
  • [28] THIN-FILM FIELD-EFFECT TRANSISTORS INCORPORATING HYDROGENATED AMORPHOUS-SILICON PRODUCED BY RF MAGNETRON SPUTTERING
    ABDULRIDA, MC
    ALLISON, J
    THIN SOLID FILMS, 1983, 102 (04) : L43 - L46
  • [29] FIELD-EFFECT STUDY OF THE STAEBLER-WRONSKI EFFECT IN HYDROGENATED AMORPHOUS-SILICON
    BAUTISTA, LB
    ENOMOTO, H
    OZAKI, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (02): : 153 - 159
  • [30] Amorphous silicon junction field-effect transistor for digital and analog applications
    Caputo, D
    de Cesare, G
    Kellezi, V
    Palma, F
    APPLIED PHYSICS LETTERS, 2000, 77 (09) : 1390 - 1392