Anomalous Hall resistance in Si(001) high mobility inversion layers at high electron concentrations

被引:0
|
作者
Semenchinsky, S. [1 ]
Smrčka, L. [2 ]
Stehno, J. [2 ]
Borzenets, V. [2 ,3 ]
机构
[1] Institute for Metrological Service, 2 Andreevskaya Nab., 117334 Moscow, Russia
[2] Institute of Physics, Acad. of Sci. of the Czech Republic, Cukrovarnická 10, 162 00 Prague 6, Czech Republic
[3] Inst. for Low Temp. Phys. and Eng., 47 Lenin Avenue, Kharkov 310164, Ukraine
关键词
This work was supported by the Grant Agency of the Czech Republic under Contract No. 202/96/0036 and by the Fund for Fundamental Research of Russia through Grant No. 96-02-16838;
D O I
暂无
中图分类号
学科分类号
摘要
9
引用
收藏
页码:335 / 339
相关论文
共 50 条
  • [1] Anomalous Hall resistance in Si(001) high mobility inversion layers at high electron concentrations
    Semenchinsky, S
    Smrcka, L
    Stehno, J
    Borzenets, V
    PHYSICS LETTERS A, 1996, 217 (06) : 335 - 339
  • [2] LOW-TEMPERATURE ELECTRON-MOBILITY IN SI(001) INVERSION-LAYERS
    CHAM, KM
    STERN, F
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1981, 26 (03): : 316 - 316
  • [3] ELECTRON-MOBILITY IN SI INVERSION-LAYERS
    MASAKI, K
    TANIGUCHI, K
    HAMAGUCHI, C
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1992, 7 (3B) : B573 - B575
  • [4] ELECTRON-MOBILITY IN SI INVERSION-LAYERS
    MASAKI, K
    HAMAGUCHI, C
    TANIGUCHI, K
    IWASE, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (10): : 1856 - 1863
  • [5] Temperature dependence of electron mobility in Si inversion layers
    Masaki, Kazuo
    Taniguchi, Kenji
    Hamaguchi, Chihiro
    Wase, Masao
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1991, 30 (11 A): : 2734 - 2739
  • [6] Origin of mobility enhancement in hole inversion layers on (001) strained Si
    Tezuka, T
    Sugiyama, N
    Takagi, S
    Kurobe, A
    PROCEEDINGS OF THE 25TH INTERNATIONAL CONFERENCE ON THE PHYSICS OF SEMICONDUCTORS, PTS I AND II, 2001, 87 : 1753 - 1754
  • [7] ELECTRON-MOBILITY BEHAVIOR FOR SI(001) INVERSION-LAYERS NEAR MOBILITY THRESHOLD BELOW 1.3 K
    BORZENETS, VV
    FEHER, S
    ORENDAC, M
    SEMENCHINSKY, SG
    PHYSICS LETTERS A, 1995, 204 (01) : 67 - 70
  • [8] Interaction effects in conductivity of a two-valley electron system in high-mobility Si inversion layers
    Klimov, N. N.
    Knyazev, D. A.
    Omel'yanovskii, O. E.
    Pudalov, V. M.
    Kojima, H.
    Gershenson, M. E.
    PHYSICAL REVIEW B, 2008, 78 (19)
  • [9] AN EXPLANATION FOR THE OBSERVED QUANTIZATION OF HALL RESISTANCE IN SI INVERSION-LAYERS
    TSUI, DC
    ALLEN, SJ
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1981, 26 (01): : 19 - 19
  • [10] ELECTRON LOCALIZATION AND THE QUANTIZED HALL RESISTANCE IN SILICON INVERSION LAYERS.
    Wakabayashi, J.
    Myron, H.W.
    Pepper, M.
    Physica B: Physics of Condensed Matter & C: Atomic, Molecular and Plasma Physics, Optics, 1982, 117-118 (Pt II): : 691 - 693