Spectral brightness and other improvements to the tunable ArF excimer laser

被引:0
|
作者
NASA Langley Research Cent, Hampton, United States [1 ]
机构
来源
Rev Sci Instrum | / 7卷 / 2591-2594期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [41] ArF excimer laser lithography with bottom antireflective coating
    Kishimura, S
    Takahashi, M
    Nakazawa, K
    Ohfuji, T
    Sasago, M
    Uematsu, M
    Ogawa, T
    Ohtsuka, H
    OPTICAL MICROLITHOGRAPHY XI, 1998, 3334 : 310 - 321
  • [42] Long lifetime operation of an ArF-excimer laser
    Saito, T
    Ito, S
    Tada, A
    APPLIED PHYSICS B-LASERS AND OPTICS, 1996, 63 (03): : 229 - 235
  • [43] MECHANISM OF ARF EXCIMER LASER DOPING USING BF
    KATO, S
    NAGAHORI, T
    MATSUMOTO, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C432 - C432
  • [44] Photochemical reactions in silicon nitride with ArF excimer laser
    Kurosawa, K
    Herman, PR
    Takigawa, Y
    Kameyama, A
    Yokotani, A
    Sasaki, W
    LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING II, 1997, 2991 : 59 - 65
  • [45] Catadioptric system design for ArF excimer laser lithography
    Chung, HB
    Lee, KH
    Yoo, KJ
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1996, 29 (03) : 305 - 309
  • [46] Stabilization of ZrSixOy films by irradiation with an ArF excimer laser
    Nakazawa, K
    Matsuo, T
    Onodera, T
    Ogawa, T
    Morimoto, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (7B): : 4561 - 4566
  • [47] Performance analysis of ArF excimer laser lithography optics
    Lee, KH
    Kim, DH
    Kim, JS
    Chung, HB
    Yoo, HJ
    OPTICAL MICROLITHOGRAPHY X, 1997, 3051 : 948 - 958
  • [48] Compound cavity ArF excimer laser with high efficiency
    Fan Y.
    Zhou Y.
    Liu G.
    Song X.
    Shan Y.
    Wang Q.
    Zhao J.
    Zhou, Yi (zhouyi@aoe.ac.cn), 1600, Science Press (43):
  • [49] A WIDELY TUNABLE XECL EXCIMER LASER
    CHALTAKOV, IV
    MINKOVSKI, NI
    TOMOV, IV
    OPTICS COMMUNICATIONS, 1988, 65 (06) : 437 - 439
  • [50] Operation of KrF and ArF tunable excimer lasers without Cassegrain optics
    Laser-Laboratorium Goettingen, Goettingen, Germany
    Appl Phys B, 3 (241-247):