Long lifetime operation of an ArF-excimer laser

被引：8
|
作者：
Saito, T
Ito, S
Tada, A
机构：
来源：
APPLIED PHYSICS B-LASERS AND OPTICS | 1996年 / 63卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
An experimental investigation to improve the lifetime of a discharge-excited ArF-excimer laser is presented. The three dominant factors restricting its lifetime are CF4 generation in the laser gas, color-center formation in the optics and input power density reduction due to electrode ablation. Copper electrodes were superior to nickel electrodes in regard to electrode ablation. A gas lifetime of more than 10(9) shots (about one month at 400 Hz) is shown for an ArF-excimer laser with a liquid-nitrogen trap and high-temperature zirconium alloy trap.
引用
收藏
页码：229 / 235
页数：7
相关论文
共 50 条
  • [1] ArF-excimer laser ablation experiments on Cycloolefin Copolymer (COC)
    Sabbert, D
    Landsiedel, J
    Bauer, HD
    Ehrfeld, W
    APPLIED SURFACE SCIENCE, 1999, 150 (1-4) : 185 - 189
  • [2] EFFECTS OF ARF-EXCIMER LASER IRRADIATION ON HUMAN ENAMEL AND DENTIN
    ARIMA, M
    MATSUMOTO, K
    LASERS IN SURGERY AND MEDICINE, 1993, 13 (01) : 97 - 105
  • [3] A scanning and rotating slit ArF-Excimer laser delivery system for PRK: principles of operation and technical features
    Lubatschowski, H
    Kermani, O
    Welling, H
    OPHTHALMOLOGE, 1997, 94 (02): : 114 - 119
  • [4] ArF-excimer laser as a potential tool for manufacturing of biomedical polymeric devices
    Stepak, B.
    Kobielarz, M.
    Gazinska, M.
    Szustakiewicz, K.
    Pezowicz, C.
    Antonczak, A. J.
    EXPRESS POLYMER LETTERS, 2021, 15 (08): : 808 - 824
  • [5] ARF-EXCIMER LASER-INDUCED SECONDARY RADIATION IN PHOTOABLATION OF BIOLOGICAL TISSUE
    LUBATSCHOWSKI, H
    KERMANI, O
    OTTEN, C
    HALLER, A
    SCHMIEDT, KC
    ERTMER, W
    LASERS IN SURGERY AND MEDICINE, 1994, 14 (02) : 168 - 177
  • [6] Influence of the ablation plume on the removal process during ArF-excimer laser photoablation
    Dorbecker, C
    Lubatschowski, H
    Lohmann, S
    Ruff, C
    Kermani, O
    Ertmer, W
    LASERS IN OPHTHALMOLOGY III, PROCEEDINGS OF, 1996, 2632 : 2 - 9
  • [7] Characterization of photoresists for ArF-excimer laser lithography using monoenergetic positron beams
    Uedono, A
    Ohdaira, T
    Suzuki, R
    Mikado, T
    Fukui, S
    Kimura, S
    Miyamoto, H
    Nemoto, H
    JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS, 2004, 42 (02) : 341 - 346
  • [8] Characterisation of the removal process on ArF-excimer laser photoablation influenced by the ablation plume
    Kermani, O
    Lubatschowski, H
    Dorbecker, C
    Ertmer, W
    INVESTIGATIVE OPHTHALMOLOGY & VISUAL SCIENCE, 1996, 37 (03) : 2604 - 2604
  • [9] Physical and optical limitations using ArF-excimer and Er:YAG laser for PRK
    Semchishen, V
    Mrochen, M
    Seiler, T
    OPHTHALMIC TECHNOLOGIES VIII, PROCEEDINGS OF, 1998, 3246 : 283 - 289
  • [10] Influence of laser fluence in ArF-excimer laser assisted crystallisation of a-SiGe:H films
    Chiussi, S
    López, E
    Serra, J
    González, P
    Serra, C
    León, B
    Fabbri, F
    Fornarini, L
    Martelli, S
    APPLIED SURFACE SCIENCE, 2003, 208 : 358 - 363
12345