Spectral brightness and other improvements to the tunable ArF excimer laser

被引：0
|
作者：
NASA Langley Research Cent, Hampton, United States [1 ]
机构：
来源：
Rev Sci Instrum | / 7卷 / 2591-2594期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] ARF EXCIMER LASER DOPING OF BORON INTO SILICON
    KATO, S
    NAGAHORI, T
    MATSUMOTO, S
    JOURNAL OF APPLIED PHYSICS, 1987, 62 (09) : 3656 - 3659
  • [22] ArF excimer laser resists based on fluoroalcohol
    Ito, H
    Truong, HD
    Allen, RD
    Li, W
    Varanasi, PR
    Chen, KJ
    Khojasteh, M
    Huang, WS
    Burns, SD
    Pfeiffer, D
    POLYMERS FOR ADVANCED TECHNOLOGIES, 2006, 17 (02) : 104 - 115
  • [23] Development of Photoresists for ArF Excimer Laser Lithography
    Nozaki, Koji
    JOURNAL OF SYNTHETIC ORGANIC CHEMISTRY JAPAN, 2018, 76 (09) : 956 - 965
  • [24] ArF excimer laser for 193 nm lithography
    Stamm, U
    Patzel, R
    Kleinschmidt, J
    Vogler, K
    Zschocke, W
    Bragin, I
    Basting, D
    OPTICAL MICROLITHOGRAPHY XI, 1998, 3334 : 1010 - 1013
  • [25] ArF excimer laser for 193 nm lithography
    Stamm, U
    Kleinschmidt, J
    Heist, P
    Bragin, I
    Patzel, R
    Basting, D
    OPTICAL MICROLITHOGRAPHY X, 1997, 3051 : 868 - 873
  • [26] Copper film prepared with ArF excimer laser
    Yoshida, A
    Sato, H
    Uchida, M
    Wakahara, A
    Hoshino, A
    Machida, H
    APPLIED SURFACE SCIENCE, 2001, 169 : 493 - 495
  • [27] STRUCTURING OF POLYIMIDE BY ARF EXCIMER LASER ABLATION
    SPIESS, W
    STRACK, H
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1989, 4 (06) : 486 - 490
  • [28] Development of pellicle for use with ArF excimer laser
    Shigematsu, S
    Matsuzaki, H
    Nakayama, N
    Mase, H
    PHOTOMASK AND X-RAY MASK TECHNOLOGY IV, 1997, 3096 : 93 - 103
  • [29] Prospects and challenges of ArF excimer laser lithography
    Yokohama Research Cent./Assoc. of, Super-Advanced Electronics, Technologies
    Proc SPIE Int Soc Opt Eng, 1600, (190-192):
  • [30] A SIMPLE TUNABLE SHORT-PULSE XECL LASER WITH HIGH SPECTRAL BRIGHTNESS
    TAKAHASHI, A
    SUMI, M
    MAEDA, M
    OPTICS COMMUNICATIONS, 1985, 55 (03) : 193 - 196
12345