Ion energy distributions in a pulsed plasma doping system

被引:0
|
作者
机构
[1] Radovanov, S.
[2] Godet, L.
[3] Dorai, R.
[4] Fang, Z.
[5] Koo, B.W.
[6] Cardinaud, C.
[7] Cartry, G.
[8] Lenoble, D.
[9] Grouillet, A.
来源
Radovanov, S. (svetlana.radovanov@vsea.com) | 1600年 / American Institute of Physics Inc.卷 / 98期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
18
引用
收藏
相关论文
共 50 条
  • [31] Ion energy distribution measurements in rf and pulsed dc plasma discharges
    Gahan, D.
    Daniels, S.
    Hayden, C.
    Scullin, P.
    O'Sullivan, D.
    Pei, Y. T.
    Hopkins, M. B.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2012, 21 (02):
  • [32] Ion energy, charge, and mass distributions in nanosecond surface discharge plasma
    S. V. Barakhvostov
    I. L. Muzyukin
    Technical Physics Letters, 2004, 30 : 900 - 901
  • [33] Tailored ion energy distributions at an rf-biased plasma electrode
    Qin, X. V.
    Ting, Y-H
    Wendt, A. E.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2010, 19 (06):
  • [34] Ion energy distributions in highly transient EUV induced plasma in hydrogen
    van de Ven, T. H. M.
    Reefman, P.
    de Meijere, C. A.
    van der Horst, R. M.
    van Kampen, M.
    Banine, V. Y.
    Beckers, J.
    JOURNAL OF APPLIED PHYSICS, 2018, 123 (06)
  • [35] Ion energy, charge, and mass distributions in nanosecond surface discharge plasma
    Barakhvostov, SV
    Muzyukin, IL
    TECHNICAL PHYSICS LETTERS, 2004, 30 (11) : 900 - 901
  • [36] ION ENERGY AND ANGULAR DISTRIBUTIONS IN RF CAPACITIVELY COUPLED PLASMA SOURCES
    Manuilenko, O., V
    Minaeva, K. M.
    PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY, 2006, (05): : 116 - +
  • [37] Ion energy distributions in highly transient EUV induced plasma in hydrogen
    1600, American Institute of Physics Inc. (123):
  • [38] Ion energy and charge state distributions in zirconium nitride arc plasma
    Chhowalla, M
    APPLIED PHYSICS LETTERS, 2003, 83 (08) : 1542 - 1544
  • [39] Ion energy distributions and efficiency of sputtering process in HIPIMS system
    Burcalova, K.
    Hecimovic, A.
    Ehiasarian, A. P.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2008, 41 (11)
  • [40] Contamination control in a pulsed plasma doping tool
    Walther, S
    Liebert, RB
    Felch, S
    Fang, ZW
    Koo, BW
    2000 INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 2000, : 500 - 503