Thin film reaction and structure of resulting interface of metal-silicon systems

被引：0
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作者：
Echigoya, J. [1 ]
机构：
[1] Tohoku Univ, Sendai, Japan
来源：
Materials Forum | 1993年 / 17卷 / 01期
关键词：
Interfacial reactions - Metal silicon systems;
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页码：15 / 26
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