Thin film reaction and structure of resulting interface of metal-silicon systems

被引：0

作者：

Echigoya, J. ^{[1
]}

机构：

[1] Tohoku Univ, Sendai, Japan

来源：

Materials Forum | 1993年 / 17卷 / 01期

关键词：

Interfacial reactions - Metal silicon systems;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：15 / 26

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